Abstract:Amorphous silicon (α-Si) thin films are widely used as electrical, optical and mechanical materials mainly synthesized by chemical vapor deposition (CVD) methods such as plasma-enhanced chemical vapor deposition (PECVD) and low pressure chemical vapor deposition. However, the physical vapor deposition ways which are seldom studied may demonstrate a proper choice for the deposition of α-Si thin films as the structural material for micro-electromechanical systems application. One of the CVD methods of e-beam thermal evaporation was used for the deposition of α-Si thin films in this study. All samples of deposited α-Si thin films had smooth surface with the root mean square surface roughness less than 1.6 nm. The α-Si film with a relatively low stress of about 250 MPa was obtained with a film thickness of 500 nm at a deposition rate of 4.7−6.1 Å/s. The film thickness variation of α-Si deposited on a 4 inch white glass had a 0.78 % uniformity. The 150-nm-thick α-Si film showed a good conformality on the patterned 500-nm-thick Mo film and it had a leak current density of 2.8 × 10−3 A/cm2 under a 5 V bias voltage. The film’s Young’s modulus and hardness were extracted by a nano-indenter with values of 71.6 and 7.9 GPa, respectively. Characteristics of evaporated α-Si films and PECVD α-Si:H films were also compared.

PHYSICAL PROPERTIES OF WEDGE-SHAPED Al THIN FILM

SURFACE MORPHOLOGY AND GROWTH MECHANISM OF THE Al FILMS DEPOSITED ON LIQUID SURFACES

Anomalous Hopping and Tunneling Effects in a New Aluminum Film Percolation System

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

Anomalous Hopping and Tunneling Effects on the Conductivity of A Wedge-Shaped Au Film System

Anomalous Electrical Conductivity of a Gold Thin Film Percolation System

CHARACTERISTICS OF Ag THIN FILMS DEPOSITED ON THE FRACTAL SUBSTRATES OF Α-Al２ｏ3 CERAMICS

Structural and Electrical Properties of A Metallic Rough-Thin-Film System Deposited on Liquid Substrates

Absorption Behavior Of The Thin Silver Films Deposited On Fracture Surfaces Of Alpha-Al2o3 Ceramics

COHERENT GROWTH OF Α-W FILM ON Si WAFER AND ITS THICKNESS DEPENDENT MECHANICAL AND ELECTRICAL PROPERTIES

Shrunk Lattice Structure and Interdiffusion Characteristics of 5 Nm Thick Al(2)O(3) Ultrathin Films Sputtered on Silicon.

CATHODICALLY ELECTROCHEMICAL-ASSISTED DEPOSITION AND PROTECTIVE PROPERTIES OF SILANE FILMS

Structural and Electrical Properties of an Au Film System Deposited on Silicone Oil Surfaces

Growth and Morphology of Ultra-Thin Al Films on Liquid Substrates Studied by Atomic Force Microscopy

Morphology Of Al2o3 Film Fabricated By Atomic Layer Deposition

Influence of the Liquid Substrate Temperature on the Band-Shaped Ordered Structures in an Al Film System

Expansion Effect of Liquid Substrates on the Ordered Structures in the Al Films

Spontaneous Formation of Ordered Patterns in Al Films Deposited on Silicone Oil Surfaces

Low Loss Single Crystalline Aluminum Films Obtained on Si (1 1 1) Through Interfacial Modulation

Template-induced Formation of Α-W and Size-Dependent Properties of Tungsten Thin Films

Characterizations of Evaporated Α-Si Thin Films for MEMS Application