Preparation of CuInSe 2 Film with Electrodeposition

WY Li,J Yu,XB Yu,QL Chen,X Cai
DOI: https://doi.org/10.1117/12.408435
2000-01-01
Abstract:CuInSe2(CIS) films directly electrodeposited on sputtered Mo-glass, sprayed SnO2-glass substrates had been accomplished at room temperature in the potentionstatic mode from a bath containing CuCl, InCl3. 4H(2)O and SeO2. The acidity of bath was adjusted to 1PH. Energy dispersive spectrometry (EDS), Atomic force microscopy (AFM), x-ray diffraction (XRD) and hot-probe method was utilized to characterize the CIS films. The key factor for preparing single-phase CuInSe2 is the proportion of CuCl, InCl3. 4H(2)O and SeO2. The CIS films are nearly stoichiometry of CuInSe2 and polycrystalline on Mo-glass. The Cu excess films are p-type semiconducter, and the In excess films n-type. The deposition potential obviously affects the surface morphology of CIS films. AFM results had indicated that the CIS films on Mo-glass grow in layer and on SnO2 glass in island.
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