Preliminary Study of Ferroelectric Domains of (pb,la)tio3 Films Grown by RF Magnetron Sputtering

Wu Jiagang,Liu Hong,Pu Zhaohui,Xiao Dingquan,Zhu Jiliang,Zhu Jianguo
DOI: https://doi.org/10.3969/j.issn.1672-7126.2006.02.006
2006-01-01
Abstract:Microstructures and ferroelectric domains of (Pb,La) TiO3 [PLT] films, grown by RF magnetron sputtering and annealed at 600℃ for 60 min, were characterized with X-ray diffraction (XRD) and piezo-response force microscopy (PFM). The results show that under optimum growth conditions, pure perofskite phase forms in the PLT films. Various factors, including sputtering pressure, the ratio of oxygen and argon in the gas mixture and annealing temperature, strongly affect crystal structure of the films. Moreover, PFM images indicate that the 180° domain dominates in the PLT films.
What problem does this paper attempt to address?