Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Fabrication of Sub-50-nm Solid-State Nanostructures on the Basis of Dip-Pen Nanolithography

Fabrication of Sub-Diffraction-limit Molecular Structures by Scanning Near-Field Photolithography

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

Fabrication of Gold Micro- and Nanostructures by Photolithographic Exposure of Thiol-Stabilized Gold Nanoparticles

Fabrication Of Micro-Nano Hybrid Patterns On A Solid Surface

Direct Patterning of Modified Oligonucleotides on Metals and Insulators by Dip-Pen Nanolithography

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography☆

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Fabrication of Submicron Structures in Nanoparticle/polymer Composite by Holographic Lithography and Reactive Ion Etching

Fabrication of metallic nanodots in large-area arrays by mold-to-mold cross imprinting (MTMCI).

Tailoring Two-Dimensional Nanoparticle Arrays into Various Patterns

Laser patterning of conductive gold micronanostructures from nanodots.

Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers.

Generation of Nanostructures by Scanning Near-Field Photolithography of Self-Assembled Monolayers and Wet Chemical Etching

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Unconventional Lithography for Patterned Nanomaterials

Microfabrication of Nanoscale Cluster Chains on A Patterned Si Surface

Fabrication of 5 Nm Linewidth and 14 Nm Pitch Features by Nanoimprint Lithography

Atomic Gold–enabled Three-Dimensional Lithography for Silicon Mesostructures

Nanopatterned Assembling of Colloidal Gold Nanoparticles on Silicon