Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Fabrication of Submicron Structures in Nanoparticle/polymer Composite by Holographic Lithography and Reactive Ion Etching

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Fabrication of photopolymer hierarchical micronanostructures by coupling electrospinning and photolithography for SERS substrates

Unconventional Lithography for Patterned Nanomaterials

High-aspect-ratio three-dimensional polymer and metallic microstructure microfabrication using two-photon polymerization

Spatial patterning of colloidal nanoparticle-based thin film by a combinative technique of layer-by-layer self-assembly and lithography

Printing on particles: combining two-photon nanolithography and capillary assembly to fabricate multi-material microstructures

Recent Progress of Lithographic Micro Fabrication by the Tpa-Induced Photopolymerization

Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers.

Lithography with a mask of block copolymer microstructures

SCS nano-structures fabricated by hybrid process of HNA selective etching and oxidization

Fabrication of Sub-Diffraction-limit Molecular Structures by Scanning Near-Field Photolithography

Fabrication of Polymeric 3D Structure Containing Metal/metal Oxide Nanoparticles by Two-Photon Processes

Fabrication Of Micro-Nano Hybrid Patterns On A Solid Surface

Glass etching to bridge micro- and nanofluidics.

Nanostructures for all-polymer microfluidic systems

New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching

Fabrication of fillable microparticles and other complex 3D microstructures

Maskless Fabrication of Small-Scale Structures Through Controlling Phase Interactions

Sub-wavelength Lithography of Complex 2D and 3D Nanostructures without Dyes