Fabrication of metallic nanodots in large-area arrays by mold-to-mold cross imprinting (MTMCI).

Sunghoon Kwon,Xiaoming Yan,Anthony M Contreras,J Alexander Liddle,Gabor A Somorjai,Jeffrey Bokor
DOI: https://doi.org/10.1021/nl051932+
IF: 10.8
2005-01-01
Nano Letters
Abstract:We have developed a mold-to-mold cross imprint (MTMCI) process, which redefines an imprint mold with another imprint mold. By performing MTMCI on two identical imprint molds with silicon spacer nanowires in a perpendicular arrangement, we fabricated a large array of sub-30-nm silicon nanopillars. Large-area arrays of Pt dots are then produced using nanoimprint lithography with the silicon nanopillar mold.
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