Improved Photoelectrical Properties of N-Zno/P-Si Heterojunction by Inserting an Optimized Thin Al2o3 Buffer Layer

Hong-Liang Lu,Yu-Zhu Gu,Yuan Zhang,Xin-Yan Liu,Peng-Fei Wang,Qing-Qing Sun,Shi-Jin Ding,David Wei Zhang
DOI: https://doi.org/10.1364/oe.22.022184
IF: 3.8
2014-01-01
Optics Express
Abstract:The n-ZnO/p-Si heterojunction with an ultrathin Al₂O₃ buffer layer was prepared by atomic layer deposition. X-ray diffraction revealed that the crystalline quality of (100)-oriented ZnO films was improved with an Al₂O₃ buffer layer. The n-ZnO/p-Si heterojunction with 5 nm inserted Al₂O₃ layer shows the best electrical characteristics, with a dark current of 0.5 μA at a reverse bias of -2 V and increasing the photo-to-dark current ratio effectively by 8 times. These results demonstrated that Al₂O₃ buffer layer with optimized thickness exhibits significant advantages in enhancing the crystal quality of ZnO film and improving the photoelectrical properties of n-ZnO/p-Si photodetectors.
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