High Mg effective incorporation in Al-rich Al x Ga 1 - x N by periodic repetition of ultimate V/III ratio conditions

Tongchang Zheng,Wei Lin,Duanjun Cai,Weihuang Yang,Wei Jiang,Hangyang Chen,Jinchai Li,Shuping Li,Junyong Kang
DOI: https://doi.org/10.1186/1556-276X-9-40
2014-01-01
Nanoscale Research Letters
Abstract:According to first-principles calculations, the solubility of Mg as a substitute for Ga or Al in Al x Ga 1 – x N bulk is limited by large, positive formation enthalpies. In contrast to the bulk case, the formation enthalpies become negative on Al x Ga 1 – x N surface. In addition, the N-rich growth atmosphere can also be favorable to Mg incorporation on the surface by changing the chemical potentials. On the basis of these special features, we proposed a modified surface engineering technique that applies periodical interruptions under an ultimate V/III ratio condition (extremely N-rich), to enhance Mg effective incorporation. By optimizing the interruption conditions (2 nm interruption interval with 2 s interruption time), the enhancement ratio can be up to about 5 in the Al 0.99 Ga 0.01 N epilayer.
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