Abstract:Various defects during the manufacture of a high-energy laser monocrystalline silicon reflector will increase the energy absorption rate of the substrate and worsen the optical properties. Micron-scale or larger manufacturing defects have been inhibited by mechanism study and improvement in technology, but the substrate performance still fails to satisfy the application demand. We focus on the changes in the optical properties affected by nanoscale and Angstrom lattice defects on the surface of monocrystalline silicon and acquire the expected high reflectivity and low absorptivity through deterministic control of its defect state. Based on the first principles, the band structures and optical properties of two typical defect models of monocrystalline silicon—namely, atomic vacancy and lattice dislocation—were analyzed by molecular dynamics simulations. The results showed that the reflectivity of the vacancy defect was higher than that of the dislocation defect, and elevating the proportion of the vacancy defect could improve the performance of the monocrystalline silicon in infrared (IR) band. To verify the results of simulations, the combined Ion Beam Figuring (IBF) and Chemical Mechanical Polishing (CMP) technologies were applied to introduce the vacancy defect and reduce the thickness of defect layer. After the process, the reflectivity of the monocrystalline silicon element increased by 5% in the visible light band and by 12% in the IR band. Finally, in the photothermal absorption test at 1064 nm, the photothermal absorption of the element was reduced by 80.5%. Intense laser usability on the monocrystalline silicon surface was achieved, and the effectiveness and feasibility of deterministic regulation of optical properties were verified. This concept will be widely applied in future high-energy laser system and X-ray reflectors.

Damage Thresholds of (Zro(2)-Y(2)o(3)/sio(2) Reflectors Used for XeCl Lasers.

Excimer Laser Reflectors

Antireflective Coatings Used for High-Power Co2-Laser

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source

Silicon Reflectors for External Cavity Lasers Based on Ring Resonators

High Damage Threshold Semiconductor Saturable Absorber Mirror for Fiber Lasers

Femtosecond laser ablation of crystals SiO2 and YAG

Pulsed HF/DF Laser Damage in Window Materials.

Enhancement of the Load Capacity of High-Energy Laser Monocrystalline Silicon Reflector Based on the Selection of Surface Lattice Defects

Sol-gel Processing of ZrO2 and Polymer Doped-Zro2 Monolayer Reflective Films with High Laser Damage Threshold

Strategies to increase laser damage performance of Ta2O5/SiO2 mirrors by modifications of the top layer design

Effect of nanosecond laser pre-irradiation on the femtosecond laser-induced damage of Ta2O5/SiO2 high reflector

Control of the damage threshold of Si via a SiO2 coating upon irradiation with Mid-IR femtosecond laser pulses

Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

The Damage Property of Oxyfluoride Glasses Irradiated by a 351 Nm High Fluence Laser

Laser damage thresholds of ITER mirror materials and first results on in situ laser cleaning of stainless steel mirrors

Influence of Antireflection Si coatings on the Damage Threshold of fused silica upon irradiation with Mid-IR femtosecond laser pulses

Anti-reflective Mesoporous SiO2 Films with High Laser-Induced Damage Threshold

Damage characteristics of 193 nm laser irradiated on MgF2 window

Study of Laser-Irradiated Thin Films