Treatment of facial pain by percutaneous injection of the Gasserian ganglion.

R. Frothingham,J. Atchison,C. Bailey

Abstract:

What problem does this paper attempt to address?

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Laixi Sun,Ting Shao,Jianfeng Xu,Xiangdong Zhou,Xin Ye,Jin Huang,Jian Bai,Xiaodong Jiang,Wanguo Zheng,Liming Yang

DOI: https://doi.org/10.1039/c8ra06759g

IF: 4.036

2018-01-01

RSC Advances

Abstract:HF-based etching has been successful in mitigating damage precursors on the surface of fused silica optics used in high power lasers. However, wet etching generally leaves an etching trace leading to surface roughness, which seriously degrades laser beam quality (e.g., transmission loss and wave-front degradation). A way of addressing this issue is to apply plasma etching as a preprocessing step before HF etching, but so far very few studies have provided a practical scheme for engineering applications. In this work, we proposed a novel two-step scheme by combining reactive ion beam etching with dynamic chemical etching techniques. We demonstrate the combined scheme is capable of tracelessly mitigating the laser damage precursors on a fused silica surface. The 0% probability damage threshold obtained by combined etching is 1.4 times higher than that obtained by HF-based etching. The study opens a new approach towards high damage-resistant optics manufacturing and provides the potential possibility of exploring extreme interactions between high-power lasers and matter.
Laser damage thresholds of ITER mirror materials and first results on in situ laser cleaning of stainless steel mirrors

M. Wisse,L. Marot,B. Eren,R. Steiner,D. Mathys,E. Meyer

DOI: https://doi.org/10.1016/j.fusengdes.2013.03.077

IF: 1.905

2013-06-01

Fusion Engineering and Design

Abstract:A laser ablation system has been constructed and used to determine the damage threshold of stainless steel, rhodium and single-, poly- and nanocrystalline molybdenum in vacuum, at a number of wavelengths between 220nm and 1064nm using 5ns pulses. All materials show an increase of the damage threshold with decreasing wavelength below 400nm. Tests in a nitrogen atmosphere showed a decrease of the damage threshold by a factor of 2–3. Cleaning tests have been performed in vacuum on stainless steel samples after applying mixed Al/W/C/D coatings using magnetron sputtering. In situ XPS analysis during the cleaning process as well ex situ reflectivity measurements demonstrate near complete removal of the coating and a substantial recovery of the reflectivity. The first results also show that the reflectivity obtained through cleaning at 532nm may be further increased by additional exposure to UV light, in this case 230nm, an effect which is attributed to the removal of tungsten dust from the surface.

nuclear science & technology
Review of “Trypanosomes and Trypanosomiasis” by Stefan Magez and Magdalena Radwanska (Editors)

N. Golding

DOI: https://doi.org/10.1186/1756-3305-6-365

2013-12-26

Parasites & Vectors

Abstract:
Influence of Antireflection Si coatings on the Damage Threshold of fused silica upon irradiation with Mid-IR femtosecond laser pulses

George D. Tsibidis,Emmanuel Stratakis

2023-08-24

Abstract:Recent progress in the development of high-power mid-IR laser sources and the exciting laser driven physical phenomena associated with the irradiation of solids via ultrashort laser pulses in that spectral region are aimed to potentially create novel capabilities for material processing. In particularly, the investigation of the underlying physical processes and the evaluation of the optical breakdown threshold (OBT) following irradiation of bulk dielectric materials with Mid-IR femtosecond (fs) pulses has been recently presented. In this report, we will explore the conditions that generate sufficient carrier excitation levels which leads to damage upon irradiated a dielectric material (SiO2) coated with antireflection (AR) semiconducting films (Si) of variable thickness with fs pulses. Simulation results demonstrate that the reflectivity and transmissivity of the Si/SiO2 are thickness-dependent which can be employed to modulate the damage threshold of the substrate. The study is to provide innovative routes for selecting material sizes that can be used for antireflection coatings and applications in the Mid-IR region.

Optics,Materials Science,Other Condensed Matter
Control of the damage threshold of Si via a SiO2 coating upon irradiation with Mid-IR femtosecond laser pulses

George D. Tsibidis,Emmanuel Stratakis

2024-05-18

Abstract:A key issue in the use of high-power mid-infrared (Mid-IR) laser sources for a plethora of applications is the investigation of the exciting laser driven physical phenomena taking place in materials coated with dielectric films. Here, we present a theoretical investigation of the ultrafast processes and thermal response upon excitation of two-layered complexes consisting of fused silica thin films placed on silicon substrates with ultrashort pulsed lasers in the Mid-IR spectral regime. Through the development of a theoretical model, we demonstrate that the control of the underlying ultrafast phenomena and the damage threshold (DT) of the substrate are achieved via an appropriate modulation of the thickness of the SiO2 film. It is shown that a decrease of DT by up to 27% compared to the absence of coating is feasible emphasising the impact of coatings of a lower refractive index than the substrate. Besides this, it is demonstrated that no absorption of energy occurs within the SiO2 layer, therefore the dynamics of the reflectivity of the two-layered complex is directly associated with the electron excitation in the substrate. These remarkable predictions can be employed for the development of new optical coatings and components for nonlinear optics and photonics for a large range of Mid-IR laser-based applications.

Optics,Materials Science,Applied Physics,Computational Physics
Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

Laurent Gallais,Mireille Commandré

DOI: https://doi.org/10.1364/ao.53.00a186

IF: 1.9

2013-12-18

Applied Optics

Abstract:We report on extensive femtosecond laser damage threshold measurements of optical materials in both bulk and thin-film form. This study, which is based on published and new data, involved simple oxide and fluoride films, composite films made from a mixture of two dielectric materials, metallic films, and the surfaces of various bulk materials: oxides, fluorides, semiconductors, and ionic crystals. The samples were tested in comparable conditions at 1030 nm, 375 to 600 fs, under single-pulse irradiation. A large number of different samples prepared by different deposition techniques have been tested, involving classical materials used in the fabrication of optical thin film components (Ag, AlF3, Al2O3, HfO2, MgF2, Nb2O5, Pt, Sc2O3, SiO2, Ta2O5, Y2O3, and ZrO2) and their combination with codeposition processes. Their behaviors are compared with the surfaces of bulk materials (Al2O3, BaF2, CaF2, Ge, KBr, LiF, MgF2, NaCl, Quartz, Si, ZnS, ZnSe, and different silica glasses). Tabulated values of results are presented and discussed.

optics
Ultrafast Laser Material Damage Simulation—A New Look at an Old Problem

Simin Zhang,Carmen Menoni,Vitaly Gruzdev,Enam Chowdhury

DOI: https://doi.org/10.3390/nano12081259

IF: 5.3

2022-04-08

Nanomaterials

Abstract:The chirped pulse amplification technique has enabled the generation of pulses of a few femtosecond duration with peak powers multi-Tera and Peta–Watt in the near infrared. Its implementation to realize even shorter pulse duration, higher energy, and higher repetition rate laser systems relies on overcoming the limitations imposed by laser damage of critical components. In particular, the laser damage of coatings in the amplifiers and in post-compression optics have become a bottleneck. The robustness of optical coatings is typically evaluated numerically through steady-state simulations of electric field enhancement in multilayer stacks. However, this approach cannot capture crucial characteristics of femtosecond laser induced damage (LID), as it only considers the geometry of the multilayer stack and the optical properties of the materials composing the stack. This approach neglects that in the interaction of an ultrashort pulse and the materials there is plasma generation and associated material modifications. Here, we present a numerical approach to estimate the LID threshold of dielectric multilayer coatings based on strong field electronic dynamics. In this dynamic scheme, the electric field propagation, photoionization, impact ionization, and electron heating are incorporated through a finite-difference time-domain algorithm. We applied our method to simulate the LID threshold of bulk fused silica, and of multilayer dielectric mirrors and gratings. The results are then compared with experimental measurements. The salient aspects of our model, such as the implementation of the Keldysh photoionization model, the impact ionization model, the electron collision model for ‘low’-temperature, dense plasma, and the LID threshold criterion for few-cycle pulses are discussed.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
Single-Shot Multi-Stage Damage and Ablation of Silicon by Femtosecond Mid-infrared Laser Pulses

Kevin Werner,Vitaly Gruzdev,Noah Talisa,Kyle Kafka,Drake Austin,Carl M. Liebig,Enam Chowdhury

DOI: https://doi.org/10.1038/s41598-019-56384-0

2019-10-01

Abstract:Although ultrafast laser materials processing has advanced at a breakneck pace over the last two decades, most applications have been developed with laser pulses at near-IR or visible wavelengths. Recent progress in mid-infrared (MIR) femtosecond laser source development may create novel capabilities for material processing. This is because, at high intensities required for such processing, wavelength tuning to longer wavelengths opens the pathway to a special regime of laser-solid interactions. Under these conditions, due to the ${\lambda}^2$ scaling, the ponderomotive energy of laser-driven electrons may significantly exceed photon energy, band gap and electron affinity and can dominantly drive absorption, resulting in a paradigm shift in the traditional concepts of ultrafast laser-solid interactions. Irreversible high-intensity ultrafast MIR laser-solid interactions are of primary interest in this connection, but they have not been systematically studied so far. To address this fundamental gap, we performed a detailed experimental investigation of high-intensity ultrafast modifications of silicon by single femtosecond MIR pulses (${\lambda}$ = 2.7 - 4.2 ${\mu}$m). Ultrafast melting, interaction with silicon-oxide surface layer, and ablation of the oxide and crystal surfaces were ex-situ characterized by scanning electron, atomic-force, and transmission electron microscopy combined with focused ion-beam milling, electron diffractometry, and ${\mu}$-Raman spectroscopy. Laser induced damage and ablation (LIDA) thresholds were measured as functions of laser wavelength. The traditional theoretical models did not reproduce the wavelength scaling of the damage thresholds. To address the disagreement, we discuss possible novel pathways of energy deposition driven by the ponderomotive energy and field effects characteristic of the MIR wavelength regime.

Materials Science,Optics
Non-destructive testing of subsurface damage for early indication of laser-induced damage threshold in fused silica

S. Kuhn,L. Coriand,M. Trost,Anne-Sophie Munser,C. Mühlig,Nora Tadewaldt,Ulf Hallmeyer

DOI: https://doi.org/10.1117/12.2642749

2022-12-02

Abstract:Subsurface damage (SSD) in optical components is almost unavoidably caused by mechanical forces involved during grinding and polishing and can be a limiting factor, particularly for applications that require high laser powers. In this contribution, non-destructive characterization techniques are evaluated with respect to their capability to determine SSD in fused silica. For this, differently polished surfaces with different SSD levels have been prepared. An initial destructive analysis using etching in hydrofluoric acid in combination with white light interferometry revealed a high amount of SSD in one of the sample types compared to a very low amount of SSD in a second one. It is shown that nondestructive absorption as well as scattering measurements are sensitive towards SSD related differences in the samples. Finally, laser-induced damage tests proved a significant impact of SSD on the laser stability by determining a reduced damage threshold of 31 ± 3 J/cm² for the sample with high amount of SSD compared to 45 ± 5 J/cm² for the high-quality polished sample.

Engineering,Materials Science,Physics
Study of Laser-Irradiated Thin Films

Larry G DeShazer,Kang M Leung,Brian E Newman,Nabil Alyassini,Larry G. DeShazer,Kang M. Leung,Brian E. Newman

DOI: https://doi.org/10.21236/ad0774022

1973-08-01

Abstract:Laser-induced structural damage to dielectric thin-film coatings was investigated using a TEM(00) Q-switched ruby laser. This study included mono-, bi-, and multi-layered coatings of the materials TiO2, SiO2, ZrO2, MgF2, and ZnS on substrates of glass, fused silica, rocksalt and spinel. The samples included coatings for antireflection and reflection at the ruby wavelength and were produced either at USC or by a commercial vendor. Damage threshold energy densities were measured with attention paid to dependences on laser beam spot- size, film material and thickness, substrate condition and incipient scattering of the film. Two major facts about laser damage to thin films were discovered. One fact is that laser-induced scatter, indicative of film break-up, is observed prior to the threshold of spark formation at the film. The other fact is that the damage threshold of the thin-film increases as the laser beam spot- size decreases. A theoretical model was developed which correlated the nature and distribution of coating defects to this spot-size dependence.
Surface Degradation of Thin-Layer Al/MgF2 Mirrors under Exposure to Powerful VUV Radiation

Andrei Skriabin,Victor Telekh,Aleksei Pavlov,Daria Pasynkova,Anastasiya Podlosinskaya,Pavel Novikov,Valery Zhupanov,Dmitry Chesnokov,Viacheslav Senkov,Alexander Turyanskiy

DOI: https://doi.org/10.3390/nano13212819

IF: 5.3

2023-10-24

Nanomaterials

Abstract:Thin-layer Al/MgF2 coatings are currently used for extraterrestrial far-UV astronomy as the primary and secondary mirrors of telescopes (such as “Spektr-UF”). Successful Hubble far-UV measurements have been performed thanks to MgF2 on Al mirror coatings. Damage of such thin-layer coatings has been previously studied under exposure to high-energy electrons/protons fluxes and in low Earth orbit environments. Meanwhile, there is an interest to test the stability of such mirrors under the impact of extreme radiation fluxes from pulsed plasma thrusters as a simulation of emergency onboard situations and other applications. In the present studies, the high current and compressed plasma jets were generated by a laboratory plasma thruster prototype and operated as effective emitters of high brightness (with an integral overall wavelength radiation flux of >1 MW/cm2) and broadband radiation. The spectrum rearrangement and hard-photon cut-off at energy above Ec were implemented by selection of a background gas in the discharge chamber. The discharges in air (Ec ≈ 6 eV), argon (Ec ≈ 15 eV) and neon (Ec ≈ 21 eV) were studied. X-ray diffraction and reflectometry, electron and atomic force microscopy, and IR and visible spectroscopy were used for coating characterization and estimation of degradation degree. In the case of the discharges in air with photon energies of E < 6 eV, only individual nanocracks were found and property changes were negligible. In the case of inert gases, the energy fraction was ≈50% in the VUV range. As found for inert background gases, an emission of such hard photons with energies higher than the MgF2 band gap energy of ≈10.8 eV caused a drastic light-induced ablation and degradation of the irradiated coatings. The upward trend of degradation with an increasing of the maximum photon energies was detected. The obtained data on the surface destruction are useful for the design of methods for coating stability tests and an understanding of the consequences of emergencies onboard space research stations.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
Laser Induced Damage of Optical Elements–a Status Report

Alexander J. Glass,Arthur H. Guenther

DOI: https://doi.org/10.1364/ao.12.000637

IF: 1.9

1973-04-01

Applied Optics

Abstract:In the application of high-power lasers, damage to active laser materials, and to components of laser system, generally determines the limit of useful laser performance. Accordingly, there is great interest in reducing the susceptibility of optical elements ot damage. Damage in transparent dielectrics arises from three major causes, particulate inclusions or microinhomogeneities in the material, self-focusing within the materials, and surface damage due to plasma formation. The state of understanding of these phenomena, and the thresholds observed, where they have been determined, will be discussed. Dependence on pulse length will also be considered. Although most of the research accomplished to date on laser damage has concentrated on Nd-glass, the advent of very high-powered gas lasers has stimulated interest in the development of damage resistant component materials for use in the ir. Crystalline dielectrics appear to be the most likely candidate materials for ir windows. Nonlinear optics materials are particularly susceptible to damage, since they are generally exposed to high intensity radiation. Asa final item, damage in thin film dielectric coatings are considered.

optics
Investigation and modeling of optics damage in high-power laser systems caused by light backscattered in plasma at the target

T. Chapman,P. Michel,J.-M. G. Di Nicola,R. L. Berger,P. K. Whitman,J. D. Moody,K. R. Manes,M. L. Spaeth,M. A. Belyaev,C. A. Thomas,B. J. MacGowan

DOI: https://doi.org/10.1063/1.5070066

IF: 2.877

2019-01-21

Journal of Applied Physics

Abstract:High-power laser facilities may be restricted in operations by the risk of damage to optics due to the backscattering of laser light from the intended target. A portion of this backscattered light can re-enter the beam line and at sufficient fluence may damage (burn) optical apparatus. Here, the observed cumulative burn pattern on mirrors at the National Ignition Facility (NIF) due to stimulated Brillouin scattering (SBS) at the target is explained using detailed simulations. Our methodology involves using a measurement of a phase plate profile installed at the NIF to provide the laser input to a three-dimensional simulation of laser-plasma interaction in a target typical of that fielded at the NIF. Light scattered by SBS at the target is then followed back to the final aperture of the beam line, back through the phase plate, and to a mirror where damage typically occurs. We find that mirror damage patterns are largely dictated by the phase imprint of the phase plate on the returning SBS light. Our simulations show that the instantaneous SBS signal at the mirror varies on a picosecond time scale and is also highly modulated in space. Temporal averaging of the simulated SBS light pattern on the mirror reveals a pattern in close agreement with the experimentally observed damage. Understanding these burn patterns (distribution, modulation depth) may lead to future phase plate designs that limit damage throughout the optics assembly of high-powered laser facilities.

physics, applied
Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors

Stefan Braun,Hermann Mai,Matthew Moss,Roland Scholz,Andreas Leson

DOI: https://doi.org/10.1143/jjap.41.4074

IF: 1.5

2002-06-30

Japanese Journal of Applied Physics

Abstract:Pulsed laser deposition (PLD) and magnetron sputter deposition (MSD) have been used to prepare different types of Mo/Si multilayers for the extreme ultraviolet (EUV) spectral range. In the case of PLD prepared Mo/Si multilayers the deposition of 0.3–0.5 nm thick carbon barrier layers at the interfaces leads to a substantial improvement of the interface quality. This can be deduced from Cu-Kα reflectivity measurements and HRTEM observations. Consequently the EUV reflectivity has been substantially increased. For pure Mo/Si-multilayers prepared by MSD the deposition parameters have been optimized so that a normal incidence reflectivity of REUV=68.7% could be realized. Although this is one of the best experimental results achieved so far, there is still a gap between this experimental value and the theoretical limit (REUV=75.5%). One of the main reasons for this discrepancy is the formation of intermixing zones at the interfaces. With B4C and C barrier layers at the interfaces interdiffusion can be reduced. The resulting EUV reflectivity of this new type of EUV multilayers is 69.8% (λ=13.42 nm, α=1.5°) and 71.4% (λ=12.52 nm, α=22.5°).

physics, applied
Biological factors as indicators of future caries.

B. Krasse

IF: 2.607

1988-05-09

International Dental Journal

Abstract:During the last ten years the principal biological factors which have been used as indicators of future caries activity are counts of mutans streptococci and lactobacilli. The evidence that these micro-organisms play a key role in the development of dental caries has now become very strong. Methods for the identification and enumeration of mutans streptococci and lactobacilli in saliva and plaque material have been developed which are both feasible and reliable. In a few studies counts of these micro-organisms together with other factors have been related to caries incidence. The validity of the various tests show a large variation but in some studies the predictive value has been high. The best prediction of future caries activity is obtained by the combination of factors which are important contributors to the pathogenesis of dental caries.
Diamond Mirrors for High-Power Lasers

H. Atikian,N. Sinclair,P. Latawiec,X. Xiong,S. Meesala,S. Gauthier,D. Wintz,J. Randi,D. Bernot,S. DeFrances,J. Thomas,M. Roman,S. Durrant,F. Capasso,M. Loncar

DOI: https://doi.org/10.48550/arXiv.1909.06458

2019-09-13

Optics

Abstract:High-power lasers have numerous scientific and industrial applications. Some key areas include laser cutting and welding in manufacturing, directed energy in fusion reactors or defense applications, laser surgery in medicine, and advanced photolithography in the semiconductor industry. These applications require optical components, in particular mirrors, that withstand high optical powers for directing light from the laser to the target. Ordinarily, mirrors are comprised of multilayer coatings of different refractive index and thickness. At high powers, imperfections in these layers lead to absorption of light, resulting in thermal stress and permanent damage to the mirror. Here we design, simulate, fabricate, and demonstrate monolithic and highly reflective dielectric mirrors which operate under high laser powers without damage. The mirrors are realized by etching nanostructures into the surface of single-crystal diamond, a material with exceptional optical and thermal properties. We measure reflectivities of greater than 98% and demonstrate damage-free operation using 10 kW of continuous-wave laser light at 1070 nm, with intensities up to 4.6 MW/cm2. In contrast, at these laser powers, we observe damage to a standard dielectric mirror based on optical coatings. Our results initiate a new category of broadband optics that operate in extreme conditions.
Laser-induced damage and contamination testing for the next generation of LIDAR space optics

Nils Bartels,Paul Allenspacher,Thimotheus Alig,Istvan Balasa,Helmut Schröder,Gabriele Taube,Wolfgang Riede

DOI: https://doi.org/10.1117/12.2600036

2021-06-11

Abstract:We have recently reported a method to improve the laser-induced damage threshold of UV laser optics by mitigating damage precursors (nano-sized absorbers) during the manufacturing of ion-beam sputtered, anti-reflective optical coatings. To further optimize parameters of the coating and particle mitigation schemes, we had to assess the damage resistance of laser optics with a low density of damage precursors. This was achieved using large area raster scans in which a highintensity laser beam was scanned over the optical surface. Via image processing of microscopic data, we then derived the density and size distribution of laser-induced damages for each raster scan. This advanced test method is described in this work and prepared the path to the manufacturing of improved laser optics that can be used to increase the performance and reliability of lasers in future space missions. Furthermore, we report on the comparison of standard and improved laser optics in tests of laser-induced contamination at 355 and 266 nm.
Pulsed HF/DF Laser Damage in Window Materials.

M. Bass,M. Soileau,E. V. Stryland,C. Tang

1977-12-01

Abstract:Abstract : Laser damage thresholds are reported for several alkali-halides, alkaline earth fluorides, ZnSe, As2S3, sapphire, spinel and quartz at HF (2.7 micrometers) and DF (3.8 micrometers) wavelengths. A low pressure, transversely excited, double discharge laser and two different focal length lenses were used. A gaussian spatial beam distribution was obtained by spatially filtering out high order modes in the far field of an unstable resonator cavity. Sapphire was found to have the highest bulk damage threshold of the materials tested, 100 GW/sq.cm at 2.7 micrometers (peak intensity on axis). The damage threshold was found to vary as the inverse of the spot diameter. The measurements also show that all of the materials evaluated in this effort are surface damage limited when exposed to pulsed HF or DF laser radiation. Evidence concerning the roles of material manufacture, surface finishing and laser irradiation conditioning in the damage process are presented.

Materials Science,Physics
Reduced threshold ultraviolet laser ablation of glass substrates with surface particle coverage: A mechanism for systematic surface laser damage

D. M. Kane,D. R. Halfpenny

DOI: https://doi.org/10.1063/1.373100

IF: 2.877

2000-05-01

Journal of Applied Physics

Abstract:A recent study of ultraviolet laser cleaning of silica glass surfaces contaminated with medium density alumina particles has shown a systematic type of laser-induced surface damage. This is characterized as a pit which increases in diameter and depth with increasing irradiating fluence. The damage pit occurs at lower fluence levels when smaller contaminant particles are used. The pits are due to laser ablation of the particle coated glass surface. The threshold for this laser ablation is well below that for a sample of the glass in its uncontaminated condition and the efficiency of ablation is estimated as being about 1000 times greater than that for silica. This laser damage is difficult to visualize by standard optical microscopy and could easily go undetected in laser cleaning studies. It may have general implications in the application of the new laser cleaning technologies to a variety of surfaces, including dielectrics and semiconductors, where medium to high densities of contaminant particles are present. It is also significant in suggesting processes by which glass may be rendered more readily machinable by laser ablative methods.

physics, applied
Study on the UV FEL single-shot damage threshold of an Au thin film

Meiyi Wu,Qinming Li,Mingchang Wang,Qinghao Zhu,Jiandong Cai,Zhongmin Xu,Hao Zhou,Long Huang,Bingbing Zhang,Runze Qi,Zhe Zhang,Wenbin Li,Yinpeng Zhong,Weiqing Zhang

DOI: https://doi.org/10.1107/S1600577524005332

2024-09-01

Abstract:The damage threshold of an Au-coated flat mirror, one of the reflective optics installed on the FEL-2 beamline of the Dalian Coherent Light Source, China, upon far-UV free-electron laser irradiation is evaluated. The surface of the coating is characterized by profilometer and optical microscope. A theoretical approach of the phenomenon is also presented, by application of conventional single-pulse damage threshold calculations, a one-dimensional thermal diffusion model, as well as finite-element analysis with ANSYS.

Treatment of facial pain by percutaneous injection of the Gasserian ganglion.

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Laser damage thresholds of ITER mirror materials and first results on in situ laser cleaning of stainless steel mirrors

Review of “Trypanosomes and Trypanosomiasis” by Stefan Magez and Magdalena Radwanska (Editors)

Influence of Antireflection Si coatings on the Damage Threshold of fused silica upon irradiation with Mid-IR femtosecond laser pulses

Control of the damage threshold of Si via a SiO2 coating upon irradiation with Mid-IR femtosecond laser pulses

Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

Ultrafast Laser Material Damage Simulation—A New Look at an Old Problem

Single-Shot Multi-Stage Damage and Ablation of Silicon by Femtosecond Mid-infrared Laser Pulses

Non-destructive testing of subsurface damage for early indication of laser-induced damage threshold in fused silica

Study of Laser-Irradiated Thin Films

Surface Degradation of Thin-Layer Al/MgF2 Mirrors under Exposure to Powerful VUV Radiation

Laser Induced Damage of Optical Elements–a Status Report

Investigation and modeling of optics damage in high-power laser systems caused by light backscattered in plasma at the target

Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors

Biological factors as indicators of future caries.

Diamond Mirrors for High-Power Lasers

Laser-induced damage and contamination testing for the next generation of LIDAR space optics

Pulsed HF/DF Laser Damage in Window Materials.

Reduced threshold ultraviolet laser ablation of glass substrates with surface particle coverage: A mechanism for systematic surface laser damage

Study on the UV FEL single-shot damage threshold of an Au thin film