Improvement of Resistive Switching Uniformity in TiOx Film by Nitrogen Annealing

Yingtao Li,Yan Wang,Su Liu,Shibing Long,Hangbing Lv,Qi Liu,Qin Wang,Sen Zhang,Ming Liu
DOI: https://doi.org/10.3938/jkps.58.407
2011-01-01
Journal of the Korean Physical Society
Abstract:The uniformity of resistive switching parameters is important to resistive random access memory (RRAM) device, development. This work reports a remarkably improved uniformity of resistive switching parameters in atomic-layer-deposited titanium-oxide films. The broad variations of the resistive switching parameters in the as-deposited TiOx films can be improved by nitrogen annealing. Based on the results of the X-ray photoelectron spectroscopy (XPS) depth profile, the improved uniformity of resistive switching in the nitrogen-annealed TiOx films may result from the higher density of oxygen vacancies in TiOx films due to nitrogen annealing.
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