Annealing effects on microstructure and mechanical properties of sputtered multilayer Cr(1 - X)AlxN films

Xiaolu Pang,Huisheng Yang,Xuelian Liu,Kewei Gao,Yanbin Wang,Alex A. Volinsky,Alexandr A. Levin
DOI: https://doi.org/10.1016/j.tsf.2011.02.063
IF: 2.1
2011-01-01
Thin Solid Films
Abstract:Multilayer Cr(1−x)AlxN films with a total thickness of 2μm were deposited on high-speed steel by medium frequency magnetron sputtering from Cr and Al–Cr (70 at.% Al) targets. The samples were annealed in air at 400°C, 600°C, 800°C and 1000°C for 1hour. Films were characterized by cross-sectional scanning electron microscopy and X-ray diffraction analysis. The grain size of the as-deposited multilayer films is about 10nm, increasing with the annealing temperature up to 100nm. Interfacial reactions have clearly changed at elevated annealing temperatures. As-deposited films' hardness measured by nanoindentation is 22.6GPa, which increases to 26.7GPa when the annealing temperature goes up to 400 and 600°C, but hardness decreases to 21.2GPa with further annealing temperature increase from 600 to 1000°C. The multilayer film adhesion was measured by means of the scratch test combined with acoustic emission for detecting the fracture load. The critical normal load decreased from 49.7N for the as-deposited films to 21.2N for the films annealed at 1000°C.
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