Abstract:Despite the continued scaling down of semiconductor manufacturing, traditional lithography-based nanofabrication only produces thin film structures, not 3-D shapes. 3-D nanofabrication remains a major challenge, especially for semiconductor materials. Most 3-D nanofabrication techniques, such as two-photon printing and stereolithography, mostly work for polymer materials, not solid-state semiconductor materials. Here, a method capable of fabricating sophisticated 3-D nanostructures of silicon based on the subsurface swelling phenomenon using focused helium ion swelling is reported. Silicon nanosphere arrays, hierarchical nanospheres mimicking compound lenses, nano-Taichi symbols, three-layer nanotowers, and nanopumpkins have been demonstrated, which are challenging for existing nanofabrication technology. The produced silicon nanostructures exhibit super small surface roughness as small as 0.1 nm, two orders of magnitude better than existing 3-D nanofabrication technologies normally above 10 nm. The super small surface roughness opens doors for many exciting applications in photonics, indicating small photon losses. Moreover, it is demonstrated ultraprecise fine-tuning of critical dimensions of ready-made nanostructures or nanodevices, such as tuning the tilting angle of the tip on the atomic force microscopy probe and reducing the nanogap between two metal electrodes from 200 to 4 nm, which is promising for improving nanodevice performances by tuning the critical dimensions to desired ranges.

Top-down Fabrication of Vertical Silicon Nano-Rings Based on Poisson Diffraction

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Non-uniaxial Stress-Assisted Fabrication of Nanoconstriction on Vertical Nanostructured Si.

Fabrication of 2D silicon nano-mold by side etch lift-off method

Vertically Stacked Silicon Nitride Coupled Microdisk Resonators

Fabrication of Silicon Nano-Wire by Oxidation

AFM Tip-Based Fabrication of Silicon Nanostructures with Reduced Subsurface Amorphous Layers

Fabrication and Characterization of the Size-Controlled and Patterned Nc-Si Dots

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation

Simple Technique to Fabricate Microscale and Nanoscale Silicon Waveguide Devices

Top-down fabrication of sub-30 nm monocrystalline silicon nanowires using conventional microfabrication

Fabrication of Two-Dimensional Arrays of Micron-Sized Gold Rings Based on Preferential Nucleation at Reentrant Sites

Fabrication of Vertically Stacked Single-Crystalline Si Nanowires Using Self-Limiting Oxidation

Fabrication of Annular Photonic Crystals by Atomic Layer Deposition and Sacrificial Etching

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Fabrication of SiO 2 Microdisk Optical Resonator

Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography

Optimizing interferences of DUV lithography on SOI substrates for the rapid fabrication of sub-wavelength features

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching