Orientation-Dependent Charge Carrier Confinement in A Nanopatterned Silicon Film

Zheng Liu,Wenhui Duan,Bing-Lin Gu,Jian Wu
DOI: https://doi.org/10.1063/1.3486227
IF: 4
2010-01-01
Applied Physics Letters
Abstract:From first-principles calculations, we find that in a (110) Si film with surface etching along the [001] direction, the holes can be confined underneath the patterned layer. This effect arises from the interplay between the anisotropic carriers and the patterning-induced quantum confinement. An anisotropy coefficient K=mz/my, which is the ratio between the out-of-plane effective mass and the in-plane effective mass of the charge carriers in the film, is introduced to explain the orientation dependence. We propose that a modulation-dopinglike effect can be achieved in the (110) nanopatterned Si film by selective doping in the top patterned layer.
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