The time of phosphoric acid processing has effects on the field emission property of W18O49 Nanowires

R. Y. Mo,Fei Liu,Lifang Li,R. Sun,Zhuo Chen,Shaozhi Deng,Ning Xu

DOI: https://doi.org/10.1109/ivesc.2010.5644219

2010-01-01

Abstract:In comparison with other tungsten oxide nanostructures, W 18O49 nanostructures have exhibited better field emission behaviors [1], which should have a much better future in field emission devices. Recently, we have developed a new method to fabricate patterned W 18O49 nanowire arrays, which combines thermal evaporation with lift-off technology. However, it is found that the phosphoric acid processing of the lift-off technology has strong influence on the field emission property of W18O49 nanowires. For example, typical turn-on field of tungsten oxide nanowires after the treatment of the acid is about 10 MV/m, which is much higher than that of the untreated W 18O49 nanowires (3-5 MV/m). In addition, the homogeneity of emission patterns and the stability of emission current also become relatively worse after acid treatment. Until now, what leads to their unstable field emission behaviors after the lift-off process is still not clear to our knowledge, which can limit the development of the lift-off technique to fabricate nanostructure patterns. Therefore, finding the influencing factors resulting in their relatively poorer field emission performance by lift-off way is very essential. © 2010 IEEE.