Phase transition kinetics of Sb2Te3 phase change thin films

Zhai Fengxiao
DOI: https://doi.org/10.1117/12.823426
2009-01-01
Abstract:Phase transition kinetics of Sb(2)Te(3) phase change thin films was investigated in this paper. Sb(2)Te(3) thin films, with thickness of similar to 100nm, were deposited on K9 glass substrates by DC magnetron sputtering with an alloy target. The crystallization kinetics of Sb(2)Te(3) thin films under isothermal and non-isothermal annealing was analyzed by a home-made in situ temperature-dependent reflectivity tester. From the heating rate dependences of phase transition temperatures, the activation energy was derived. The obtained values of the Avrami indexes indicate that a two dimension growth crystallization mechanism is responsible for the amorphous-crystalline transformation of Sb(2)Te(3) phase change thin films. Although phase transition of Sb(2)Te(3) thin film is confirmed to be continuous in a larger temperature range, but short laser pulse can easily trigger its crystallization process and form clear and confined crystalline marks.
What problem does this paper attempt to address?