Abstract:Laser-induced damage of high reflection (HR) coatings, working at near ultraviolet (NUV) and near infrared (NIR) regions was investigated. For NIR HR coatings, the nodules still remain the most limiting defects. The E-field intensity (EFI) enhancement in nodules plays a central role for triggering laser-induced damage. We established a simple model for EFI enhancement in nodules using the focusing and light penetrating concept. With the help of finite-difference time domain (FDTD) simulations, we found that refractive indices and nodular geometries affected the focal length as well as the size of focal spots. Furthermore, the angular reflection bandwidth (ARB) of nodules determined the fraction of light that can penetrate to the focal region. For NUV HR coatings, we explored the increase of the laser-induced damage threshold (LIDT) by increasing the incident angle from 0 degrees to 65 degrees for S-polarization. The EFI in a 65 degree HR coating is more than 4 times lower compared to 0 degree HR coatings, which suggests that the LIDT of 65 degree HR coating is much higher compared to 0 degree HR coating. However, we found some contradictory results. For small testing laser beam size with a diameter of 20 mu m, the LIDT of 65 degree HR coating is 3.5 times higher compared to a 0 degree HR coating. However, for a large sized testing laser beam with a diameter of 1000 mu m, the LIDT of 65 degree HR coating is 2 times lower compared to a 0 degree HR coating. Possible reasons for the observed damage phenomena are discussed.

Laser-induced Damage of TiO2∕SiO2 High Reflector at 1064Nm

Study of Laser Induced Damage of High Reflector at 1064 Nm

Laser damage threshold measurements of 1064 nm high-reflection mirrors

Laser damage threshold measurements of 1064nm high-reflection mirrors

Characterization of Laser Induced Damage of HR Coatings with Picosecond Pulses

Investigation on Nano-Absorbing Precursors in the Picosecond Regime Via the Comparative Study of HfO2/SiO2 and Ta2O5/SiO2 High-Reflectivity Coating Damage

Nanosecond pulsed laser damage characteristics of HfO2/SiO2 high reflection coatings irradiated from crystal-film interface.

LIDT of HfO 2 /sio 2 HR Films by Different Test Modes at 1064nm and 532Nm

Nanosecond Laser-Induced Damage of High-Reflection Coatings: Nuv Through Nir

Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm.

Study on millisecond and nanosecond laser-induced damage of T iO 2/S iO 2 anti-reflectors

Laser damage resistance of dichroic mirrors at 532nm and 1064nm

Influence of outmost layer on laser induced damage threshold of 1064 nm high-reflection mirrors

Effect of nanosecond laser pre-irradiation on the femtosecond laser-induced damage of Ta2O5/SiO2 high reflector

Influence of outmost layer on laser induced damage threshold of 1064nm high-reflection mirrors

Femtosecond Laser-Induced Damage and Ultrafast Dynamics in Highs Reflection Coating

Laser damage growth characteristics of HfO2/SiO2 high reflection film at 1064 nm

Influence of Subsurface Defects on 355 Nm Laser Damage Resistance of Monolayer and Multilayer Coatings

Laser Damage Study of Nodules in Electron-Beam-evaporated HfO_2/SiO_2 High Reflectors

Laser Induced Pits in Optical Coatings

Characterization of 355 Nm Laser-Induced Damage of Mitigated Damage Sites in Fused Silica