Laser damage resistance of dichroic mirrors at 532nm and 1064nm

Xinbin Cheng,Zhengxiang Shen,Hongfei Jiao,Jinlong Zhang,Bin Ma,Tao Ding,Zhanshan Wang

DOI: https://doi.org/10.1117/12.867216

2010-01-01

Abstract:HfO2/SiO2 dichroic mirrors were prepared using reactive electron beam evaporation process. The mirrors have high reflectance at 532 nm (S polarization) and high transmittance at 1064 nm (P polarization) for angle of incidence of 45 degrees. Here we report the laser damage behaviors of the dichroic mirrors that were irradiated by 532 nm and 1064 nm nanosecond laser pulse separately. The influence of substrate polishing quality on the laser damage resistance of HfO2/SiO2 dichroic mirrors was also discussed. At 1064 nm, the nano-sized absorbers between coatings and substrate interface or subsurface are the precusors for creating damage. And the poor substrate polishing quality significantly decreases the laser induced damage threshold (LIDT). At 532 nm, two distinct damage behaviors initiating from visible nodules and nano-sized absorbers were observed. Nodules are ejected at low fluence but the ejected pits are very stable until quite high fluence around 20J/cm(2) (1 ns). The nano-sized absorbers trigger damage at medium fluence around 14J/cm(2) (1 ns), and this kind of damage grows very fast during subsequent irradiations. The substrate polishing quality has minor influence on the LIDT at 532 nm.