Abstract:By creating nodules from artificial seeds, the damage behaviors of engineered nodules were systematically studied from experimental approaches. The seed diameters, seed absorption and film absorption were varied independently to uncover a single factor's influence on the damage behavior of nodules. First, non-absorbing monodisperse SiO2 microspheres with five different sizes were used to create engineered nodules in 1.053 mu m HfO2/SiO2 high reflectors that were prepared by EB process. Laser damage test results showed that the ejection fluences of nodules monotonically decreased with the increase of silica microsphere diameters. And to our surprise, nodules initiating from 0.3 and 0.6 mu m silica seeds survived the maximum fluence of 170 J/cm(2) (10 ns). Film absorption also has big influence on the damage behaviors of nodules. Compared to the nodules in low absorbing reflectors that were prepared by EB process, the nodules in high absorbing reflectors that were prepared by IAD process exhibited a much lower ejection fluences, although the seed diameters for the comprising nodules were same. Moreover, aluminum seeds were also used to create engineered nodules. Laser damage test results showed that the ejection fluences of nodules initiating from aluminum seeds were around 2 J/cm(2) (10 ns), which is more than an order of magnitude less than the ejection fluences of nodules created from non-absorbing silica seeds. This result revealed that the seed absorption played a very important role in the laser damage of nodules.

Laser Damage Study of Nodules in Electron-Beam-evaporated HfO_2/SiO_2 High Reflectors

Using Monodisperse Sio2 Microspheres to Study Laser-Induced Damage of Nodules in Hfo2/Sio2 High Reflectors

Damage Growth Characteristics of Artificial Nodules Prepared by Different Processes

Damage Characteristics of Dual-Band High Reflectors Affected by Nodule Defects in the Femtosecond Regime

Study of Laser Induced Damage of High Reflector at 1064 Nm

HfO2/SiO2 High Reflectors for 1.064 Μm High Power Laser Applications

Using engineered defects to study laser-induced damage in optical thin films with nanosecond pulses

LIDT of HfO 2 /sio 2 HR Films by Different Test Modes at 1064nm and 532Nm

Influence of the interface-continuity on the damaging characteristics of nodular defects

Investigation on the Laser-induced Damage Morphology of HfO2/SiO2 Antireflection Films

Laser-induced Damage of TiO2∕SiO2 High Reflector at 1064Nm

Laser induced damage characteristics of nodules in thin-film polarizers

Nanosecond pulsed laser damage characteristics of HfO2/SiO2 high reflection coatings irradiated from crystal-film interface.

Laser damage growth characteristics of HfO2/SiO2 high reflection film at 1064 nm

High Laser-Induced Damage Threshold HfO2 Films Prepared by Ion-Assisted Electron Beam Evaporation

Laser Induced Pits in Optical Coatings

Influence of nodular defects on the laser damage resistance of optical coatings in the femtosecond regime.

Comparison of laser induced damage at 1064 nm and 532 nm to high-reflective film fabricated by electron beam evaporation

Growth of laser-induced damage in HfO2/SiO2 multilayer hr coatings at 532nm

Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm.

Investigation on Nano-Absorbing Precursors in the Picosecond Regime Via the Comparative Study of HfO2/SiO2 and Ta2O5/SiO2 High-Reflectivity Coating Damage