Investigation on the Laser-induced Damage Morphology of HfO2/SiO2 Antireflection Films

Kang LUO,Yun-ti PU,Zhao QIAO,Zhi-chao LIU,Jin LUO,Ji-liang ZHU,Ping MA

DOI: https://doi.org/10.3969/j.issn.1001-9677.2015.04.034

2015-01-01

Abstract:HfO2/SiO2 antireflection films were prepared by electron beam evaporation method, and one of them was annealed. The transmittance spectra were measured. Because the absorbed water in the films was dislodged after annealing, to be compared with as-deposited sample, the spectrum of annealed sample shifted to short wavelength evidently. The laser induced damage test was carried out by the Nd:YAG laser in “S-on-1” mode. The laser-induced damage morphologies of the samples were mainly craters. The formation mechanism of the damage morphologies was discussed, and found that the damages were initiated by the absorption particles in the subsurface damage layer of substrate. The absorption particles located in the cracks and absorbed laser energy, then the cracks were opened and the craters were formed. Because of the mechanism of the laser-induced damage, annealing had no evident effect on the damage morphologies. Ripples could be observed by microscope.