Abstract:Laser-induced damage of fused silica optics at 351 nm is a key factor limiting the output energy of high-power laser facility, especially the damage growth process. A comprehensive understanding of its damage growth behavior is of critical importance for high-power laser facility. Thus we study the laser-induced damage growth on the exit surface of fused silica under the subsequent illumination of 5 ns square pulses at 351 nm on a large-aperture high-power laser facility. Experiment is conducted with a 36 cm thick UV grade fused silica focus lens in clean atmosphere and at room temperature. 56 laser shots of 3 fluence in a range from 0.1 J/cm2 to 8.1 J/cm2 are fired during the experiment. And the damage initiation process and growth process are monitored and recorded with an online optics damage inspection instrument which has an optical resolution of about 50 m. Experimental results demonstrate that the sizes of exit-surface damage sites exponentially or linearly grow with laser shots and the damage growth rate increases with laser fluence. However, it is found that even under the same laser conditions the damage grow rate is not a fixed value, which means that besides the laser fluence other parameters also influence the damage grow process. In order to highlight some tendencies, we consider the single-shot damage growth rate and calculate the average of inside fluence bins. Statistical analysis shows that smaller sites tend to grow with larger growth rates than larger sites under the irradiation of the same laser fluence. This result indicates that damage growth rate is influenced by both laser fluence and damage site size. It suggests that the damage growth rule needs to be incorporated into a size-dependent growth effect. The result that higher growth rates are obtained for small damage sites may be related to the damage growth mechanism of fused silica. Damage crater of fused silica consists of a central core and numerous surrounding cracks. The defects in the central core absorb laser energy and yield plasma, then the plasma pressure will open the cracks on the periphery of the crater and lead to lateral and axial expansion of cracks which can be identified as damage growth. The fact that smaller sites grow faster than larger sites implies that smaller sites more efficiently couple laser energy into fracture energy. Our results have important implications for both the prediction of fused silica optics lifetime and the fundamental understanding of laser damage mechanism.

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Control of the damage threshold of Si via a SiO2 coating upon irradiation with Mid-IR femtosecond laser pulses

Comparative studies of laser-induced damage of several single-layer optical films

Investigating the material properties of HfO2/SiO2-based anti-reflection coatings during 1064 nm laser-induced breakdown in air and vacuum conditions

Fatigue Effect of Hafnia/silica High-Reflective Coatings under Multiple Laser Pulses at 1064 Nm

Material ejection and layer peeling-off in HfO2/SiO2 thin-film beam splitters induced by 1ω and 3ω lasers

Modulation of Microstructure and Optical Properties of Anti-Reflection HfO 2 Films by Sputtering Power and O 2 /ar Flow Ratio

Effect of annealing on the properties of HfO2-Al2O3 mixture coatings for picosecond laser applications

Transition from Isolated Submicrometer Pits to Integral Ablation of HfO 2 and SiO 2 Films under Subpicosecond Irradiation

Laser-induced Damage Growth of Fused Silica at 351 Nm on a Large-Aperture High-Power Laser Facility

High Laser-Induced Damage Threshold HfO2 Films Prepared by Ion-Assisted Electron Beam Evaporation

Surface Evolution and Laser Damage Resistance of CO2 Laser Irradiated Area of Fused Silica

Temporal Scaling Law and Intrinsic Characteristic of Laser Induced Damage on the Dielectric Coating

Laser-Induced Damage Growth on Larger-Aperture Fused Silica Optical Components at 351 Nm

Laser-induced damage growth of large-aperture fused silica optics under high-fluence 351 nm laser irradiation

Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods

Strategies to increase laser damage performance of Ta2O5/SiO2 mirrors by modifications of the top layer design

Characterization of 355 Nm Laser-Induced Damage of Mitigated Damage Sites in Fused Silica

Nonlinear absorptance of single-layer HfO2 coatings: investigating the impact of thermal and laser annealing

Evolution of Intrinsic Defects and Ring Structures on the Surface of Fused Silica Optics after CO2 Laser Conditioning.

Study on Absorbance and Laser Damage Threshold of HfO2 Films Prepared by Ion-Assisted Reaction Deposition