Total Internal Reflection Type Echelle Grating Demultiplexer Based on Amorphous Silicon Nanowire Platform

Ning Zhu,Jun Song,Lech Wosinski,Sailing He
DOI: https://doi.org/10.1117/12.802558
2008-01-01
Abstract:In this paper we present measurement results of an ultracompact echelle-grating demultiplexer based on silicon-on-insulator nanowire platform, in which we introduced a total internal reflection design of the grating facets to improve the diffraction efficiency. An average increase of the diffraction efficiency with 3.7dB is observed for the 3 channels compared to a normal design.
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