Silicon-on-Insulator-Based Compact Optical Demultiplexer Employing Etched Diffraction Grating

WH Wang,YZ Tang,YX Wang,HC Qu,YM Wu,T Li,JY Yang,YL Wang,M Liu
DOI: https://doi.org/10.1088/0256-307x/21/7/022
2004-01-01
Abstract:A compact optical demultiplexer with etched diffraction grating (EDG) is designed and fabricated on a silicon-on-insulator (SOI) material. Several 90degrees turning mirrors are used to bend the waveguides, and the size of the EDG-based demultiplexer is minimized to only 16 x 1.7 mm(2). The crosstalk is about -18 dB. The on-chip loss is about 18.2 dB, which is composed of about 16.9 dB excess loss and 1.3 dB diffraction loss. Measures to improve the performance are discussed.
What problem does this paper attempt to address?