Experimental Demonstration of a Cross-Order Echelle Grating Triplexer Based on an Amorphous Silicon Nanowire Platform.

Ning Zhu,Jun Song,Lech Wosinski,Sailing He,Lars Thylen
DOI: https://doi.org/10.1364/ol.34.000383
2009-01-01
Abstract:We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3 to 1.5 mu m with three channels located at 1310, 1490, and 1550 nm and with a footprint of 150 mu m X 130 mu m. (c) 2009 Optical Society of America
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