Photovoltaic Characteristics of Amorphous Silicon Solar Cells Using Boron Doped Tetrahedral Amorphous Carbon Films As P-Type Window Materials

Jiecai Han,Manlin Tan,Jiaqi Zhu,Songhe Meng,Binsheng Wang,Shaojun Mu,Dawei Cao
DOI: https://doi.org/10.1063/1.2539767
IF: 4
2007-01-01
Applied Physics Letters
Abstract:Boron doped tetrahedral amorphous carbon (ta-C:B) was prepared by filtered cathodic vacuum arc deposition. A band gap of 2.0eV and a conductivity of 1.42×10−7S∕cm were obtained at the doping ratio of 2.13at.%. A device structure was deduced from the conventional amorphous silicon (a-Si:H) solar cell using the ta-C:B window layer. Photovoltaic parameters of the cells were studied by varying the boron content in the ta-C:B films. A roughly 10% relative improvement of conversion efficiency was observed compared to the normal a-Si:H solar cell. The improved cell performance results from the enhancement of short wavelength response.
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