New Self-Aligned Silicon Nanowire Transistors On Bulk Substrate Fabricated By Epi-Free Compatible Cmos Technology: Process Integration, Experimental Characterization Of Carrier Transport And Low Frequency Noise

Yu Tian,Ru Huang,Yiqun Wang,Jing Zhuge,Runsheng Wang,Jia Liu,Xing Zhang,Yangyuan Wang
DOI: https://doi.org/10.1109/IEDM.2007.4419094
2007-01-01
Abstract:A new method to fabricate self-aligned silicon nanowire transistors (SNWTs) has been realized on bulk silicon substrate by fully epi-free compatible CMOS technology The SNWTs exhibit excellent immunity of short-channel effects (SCEs) and achieve high I-on/I-off ratio of 2.6x10(8). The transportation characteristics, ballistic efficiency and low frequency noise of SNWTs are investigated for the first time.
What problem does this paper attempt to address?