High-Performance Si Nanowire Transistors on Fully Si Bulk Substrate from Top-Down Approach: Simulation and Fabrication

Jing Zhuge,Yu Tian,Runsheng Wang,Ru Huang,Yiqun Wang,Baoqin Chen,Jia Liu,Xing Zhang,Yangyuan Wang
DOI: https://doi.org/10.1109/tnano.2009.2022537
2010-01-01
IEEE Transactions on Nanotechnology
Abstract:A new method to fabricate high-performance gate-all-around silicon (Si) nanowire transistors (SNWTs) based on fully Si bulk (FSB) substrate is proposed and demonstrated by both simulation and experiments in this paper. Due to the large fan-out and deep junction of Si source/drain (S/D) region connecting with the bulk substrate, the FSB SNWTs can effectively alleviate the self-heating effects with technology scaling. Thermal behavior of multiwire SNWTs is investigated and FSB SNWTs show superior self-heating immunity to SNWTs based on Si-on-insulator (SOI) substrate (SOI SNWTs). In addition, the bottom parasitic transistor can be well suppressed in this structure. Although FSB SNWTs have larger gate parasitic capacitance, the CV/I is found to be comparable to the SOI SNWTs. With self-aligned, fully epi-free compatible CMOS processes, this new architecture was successfully fabricated, which exhibit high ON-OFF current ratio of 2.6 x 10(8) due to better heat dissipation and low S/D resistance realized in this structure.
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