Experimental Investigations on Channel Backscattering Characteristics of Gate-All-around Silicon Nanowire Transistors from Top-Down Approach

Runsheng Wang,Ru Huang,Liangliang Zhang,Hongwei Liu,Dong-Won Kim,Donggun Park,Yangyuan Wang
DOI: https://doi.org/10.1063/1.2977477
IF: 4
2008-01-01
Applied Physics Letters
Abstract:In this letter, the channel backscattering characteristics and ballistic efficiency of gate-all-around silicon nanowire transistors (SNWTs) are experimentally investigated. A modified experimental extraction methodology for SNWTs is proposed, which takes into account the impact of contact resistance. It was found that without this correction, the characterized results will severely overestimate the channel backscattering in SNWTs due to the temperature sensitivity of the source contact resistance. The highest ballistic efficiency is observed in sub-40-nm SNWTs due to their quasi-one-dimensional properties, demonstrating their potential as an alternative device structure for near-ballistic transport from top-down approach.
What problem does this paper attempt to address?