Performance Study of AZO/Ag/AZO Transparent Conductive Multilayer Prepared Films by R.F Magnetron Sputtering

JIA Fang,QIAO Xue-Hang,CHEN Jian-gun,LI Shi-tao,WANG Guo-feng
DOI: https://doi.org/10.3969/j.issn.1003-501x.2007.12.008
2007-01-01
Abstract:Metal based on transparent conductive multilayer films, AZO/Ag/AZO thin films, is prepared on glass substrate at room temperature by means of radio frequency magnetic sputtering using a ceramic target whose mass ratio of ZnO2 to Al2O3 is 97:3. The influences of O2 flow rate on transmittance, sheet resistance and surface appearance were discussed and the reasons were studied in detail. The results show that the thicknesses of thin films are influenced by O2 flow rate, and the deposition rate is fastest when O2 flow rate is 4 L/min. The transmittances of thin films are not reduced with thickness increase of Ag films, when O2 is introduced to AZO thin films deposition, and the resistances are reduced. The transmittance of multilayer films, which consist of AZO films of 59nm thickness on both side respectively under O2 flow rate 4 L/min and Ag film of 33nm thickness under O2 flow rate 0 L/min, is about 90% in visible light range, and square resistivity is about 2.5Ω/□.
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