Abstract:Al-doped ZnO (AZO) films were prepared on glass substrates by RF magnetron sputtering in an Ar?+?5%H2 ambient at room temperature. The influence of film thickness (851101?nm) on the structural, electrical, and optical properties of the films was investigated. With increasing film thickness, it is found that the crystallinity of the films is improved and the surface roughness of the films increases. The decrease of resistivity is accompanied by an increase of carrier concentration and mobility. At the film thickness of 5831101?nm, larger figures of merit (FOM) of the films can be obtained, in which the film with a thickness of 803?nm has the lowest resistivity of 3.13 x 10(-4)?O?cm, a sheet resistance of 3.90?O/sq, and an average optical transmittance in the visible range of 80%. With increasing film thickness, the crystallite size, carrier concentration, and mobility of the films increase simultaneously, implying that the main scattering mechanism is the intercrystallite boundary scattering. It is found that the optical bandgap (Eg) increases from 3.50 to 3.72?eV with film thickness, and this increase can be ascribed to the BursteinMoss (BM) effect after considering all possible effect factors. The results demonstrate that AZO films deposited in an Ar?+?H2 atmosphere at room temperature are suitable for application in thin-film solar cells as transparent conductive electrode layers.

Structural and Optoelectronic Properties of AZO Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Preparation and characterization of high-transmittance AZO films using RF magnetron sputtering at room temperature

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

High Performance AZO Thin Films Deposited by RF Magnetron Sputtering at Low Temperature

Structural and Optical Properties of Al-Doped Zno Films Coated by Rf Magnetron Sputtering

Structural ,Electrical ,and Optical Properties of Transparent Conductive Al-Doped ZnO Films Prepared by RF Magnetron Sputtering

Thickness Study of AZO Films by RF Sputtering in Ar + H2 Atmosphere at Room Temperature

Effects of deposition power and pressure on the crystallinity of Al-doped ZnO thin films at glass substrates by low temperature RF magnetron sputtering

The properties of Al doped ZnO thin films deposited on various substrate materials by RF magnetron sputtering

Micrographs and Optical Properties of Al-Doped Zno Thin Films Deposited by Radio Frequency Magnetron Sputtering

Room-temperature Deposition of Transparent Conducting Al-doped ZnO Films by RF Magnetron Sputtering Method

Effect of Al-doped on Optics and Electricity of ZnO (ZnO∶Al) Thin Films

RF magnetron sputtering processed transparent conductive aluminum doped ZnO thin films with excellent optical and electrical properties

Investigation of ZnO∶Al Thin Films Deposited by RF Magnetron Sputtering

Structural and Electrical Properties of RF Magnetic Sputtered ZnO:Al(ZAO) Thin Films

The investigation of structural, surface topography, and optical behaviors of Al-doped ZnO thin films with annealing temperature deposited by RF magnetron sputtering

Influence of Substrate Temperature on the Structural, Electrical and Optical Properties of Al-Doped Zno Films by Rf Magnetron Sputtering

Optical property of Al doped ZnO thin films

Influence of Deposition Temperature on the Crystallinity of Al-doped ZnO Thin Films at Glass Substrates Prepared by RF Magnetron Sputtering Method

Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering