Band Offsets Of Er2o3 Films Epitaxially Grown On Si Substrates

Yan Zhu,Sheng Chen,Run Xu,Zebo Fang,Jian Zhao,Yongliang Fan,Xinju Yang,Zuimin Jiang

DOI: https://doi.org/10.1063/1.2196476

IF: 4

2006-01-01

Applied Physics Letters

Abstract:The experimental data on band alignments of high-k Er2O3 films epitaxially grown on Si substrates by molecular beam epitaxy are reported. By using x-ray photoelectron spectroscopy, the valence and the conduction-band offsets of Er2O3 to Si are obtained to be 3.1 +/- 0.1 and 3.5 +/- 0.3 eV, respectively, showing a roughly symmetrical offset at the conduction and the valence band. The energy gap of Er2O3 is determined to be 7.6 +/- 0.3 eV. From the band offset viewpoint, those obtained numbers indicate that Er2O3 could be a promising candidate for high-k gate dielectrics. (c) 2006 American Institute of Physics.