Electronic Structure of Yb/H–Si (111) Interface

HN Li,XX Wang,SL He,HJ Zhang,HY Li,SN Bao
DOI: https://doi.org/10.1088/1009-1963/13/11/032
2004-01-01
Abstract:Photoemission spectra are measured for Yb covered surface of wet-chemically-etched H-Si (111). The results reveal that the lattice structure of the H-Si (111) surface is stable against the deposition of Yb atoms. X-ray photoemission spectra indicate the formation of a polarized (dipole) surface layer, with the silicon negatively charged. Ultraviolet photoemission spectra exhibit the semiconducting property of the interface below one monolayer coverage. Work function variation during the formation of the Yb/H-Si (111) interface is measured by the secondary-electron cutoff in the ultraviolet photoemission spectral line. The largest decrease of work function is similar to1.65eV. The contributions of the dipole surface laver and the band bending to the work function change are determined to be similar to1.15eV and similar to0.5eV, respectively. The work function of metal Yb is determined to be similar to2.80 +/- 0.05eV.
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