Ab Initio Modeling of Schottky-Barrier Height Tuning by Yttrium at Nickel Silicide/Silicon Interface

Li Geng,Blanka Magyari-Köpe,Zhiyong Zhang,Yoshio Nishi
DOI: https://doi.org/10.1109/LED.2008.2000647
2008-01-01
Abstract:The mechanism of Schottky-barrier height (SBH) tuning by yttrium (Y) segregated at nickel silicide (NiSi2)/silicon interface is investigated based on first-principle calculations. SBH modification can be explained by a new chemical structure that forms when Y atoms substitute silicon atoms near the interface. Silicon dangling bonds are saturated, leading to a new pinning-free interfacial structure. When other layers of Y atoms are segregated in , SBH for electrons can be reduced from 0.65 to 0.1 eV. The previously reported experimental phenomena can be explained by the calculations.
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