Novel material for nonvolatile ovonic unified memory (OUM)–Ag11In12Te26Sb51 phase change semiconductor

liu bo,song zhitang,zhang ting,feng songlin,gan fuxi
DOI: https://doi.org/10.1088/1009-1963/13/7/036
2004-01-01
Chinese Physics
Abstract:In this paper, Ag11In12Te26Sb51 phase change semiconductor films have been prepared by dc sputtering. The crystallization behaviour of amorphous Ag11In12Te26Sb51 thin films was investigated by using differential scanning calorimetry and x-ray diffraction. It was found that the crystallization temperature is about 483K and the melting temperature is 754.8K and the activation energy for crystallization, E-a, is 2.07eV. The crystalline Ag11In12Te26Sb51 films were obtained using initializer. The initialization conditions have a great effect on the sheet resistance of Ag(11)n(12)Te(26)Sb(51) films. We found that the effect of the initialization condition on the sheet resistance can be ascribed to the crystallinity of Ag11In12Te26Sb51 films. The sheet resistance of the amorphous (R-amo) film is found to be larger than 1 x 10(6) Omega and that of the crystalline (R-cry) film lies in the range from about 10(3) to 10(4)Omega. So we have the ratio R-amo/R-cry =10(2) similar to 10(3), which is sufficiently large for application in memory devices.
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