Growth mechanism and characteristics of Pb(Zr 0.52 Ti 0.48 )O 3 films prepared with alternate deposition of PbZrO 3 and PbTiO 3 layers

Jingsong Liu,Shuren Zhang,Wennan You,Junlian Zhou
DOI: https://doi.org/10.1023/B:JMSC.0000013924.74733.55
IF: 4.5
2004-01-01
Journal of Materials Science
Abstract:A new sol-gel technique for preparing PZT films, in which the PZT films with a given Zr/Ti ratio can be prepared by alternate deposition of PZ and PT layers following with solid phase reactions between them was proposed. As such, the PZT films were crystallized at 600°C without post-annealing. This paper presents an island-column hybrid growth mechanism for the PZT films prepared by the technique.
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