Abstract:Tetrahedral amorphous carbon (ta-C) coatings with an intermediate sp3C fraction were deposited on single-crystal silicon wafer substrates via intermittent filtered cathode vacuum arc (FCVA) deposition. The ta-C layer thickness and sp3C fraction in the coatings were adjusted using the deposition duration and bias voltage applied to the substrate, respectively. Some of the coated specimens were annealed at 300 and 600 degrees C for 4 h in a 5-Pa vacuum. The morphologies and microstructures of the specimens were characterized using scanning electron microscopy and transmission electron microscopy. The hybridization of carbon atoms was analyzed using X-ray photoelectron spectroscopy and micro-Raman spectroscopy. The mechanical characteristics of the coatings, including the critical adhesion load between the coatings and substrates, residual stress in the coatings, and hardness, were characterized. For the specimens deposited by the same bias voltage, even their top ta-C layer thickness ranged from approximately 500 nm to 1500 nm, their residual compressive stress in the coatings was maintained at a low value by the intermittent deposition of FCVA, which varied slightly with the coating thickness. The adhesion strength was improved by increasing the thickness of the as-deposited coating from approximately 12 to 40 N. The residual compressive stress of the post-annealing specimens with sp3C fraction of 45-53.8 % exhibited monotonously increasing or V-shaped variation with increasing annealing temperature. Herein, the underlying mechanisms are discussed in detail.

Structure and Properties of Ta-C Films Deposited by Filtered Cathodic Vacuum Arc Technology As a Function of Substrate Bias

Effect of Substrate Bias on Microstructure and Properties of Tetrahedral Amorphous Carbon Films

Density Changes with Substrate Negative Bias for Ta-C Films Deposited by Filter Cathode Vacuum Arc

Correlations between substrate bias, microstructure and surface morphology of tetrahedral amorphous carbon films

Effect of substrate bias on ta-C films deposited by magnetically enhanced vacuum arc

Structural, Mechanical and Frictional Properties of Tetrahedral Amorphous Carbon Film by Filtered Cathodic Vacuum Arc System

Raman Spectra And Mechanical Properties Of Tetrahedral Amorphous Carbon Films Deposited By Filtered Cathodic Vacuum Arc Technology

The Microstructure and Properties of Tetrahedral Amorphous Carbon Films Deposited by Filtered Arc with Accelerating at Different Energetic Grades

Structure and properties of ta-C films prepared by vacuum cathodic arc with an unbalanced external electromagnetic field

Influence of Ion Energy and Substrate Temperature on the Optical and Electronic Properties of Tetrahedral Amorphous Carbon (Ta-C) Films

S P 3 -Rich Deposition Conditions and Growth Mechanism of Tetrahedral Amorphous Carbon Films Deposited Using Filtered Arc

Substrate Bias Effect on Structure of Tetrahedral Amorphous Carbon Films by Raman Spectroscopy

Controlling Adhesion and Thermal Stability of Tetrahedral Amorphous Carbon Coatings with Intermediate Sp3c Fraction

Correlation between substrate bias, growth process and structural properties of phosphorus incorporated tetrahedral amorphous carbon films

A Tribological Study of Tetrahedral Amorphous Carbon Films Prepared by Filtered Cathodic Vacuum Arc Technique

Microstructure evolution and mechanical properties of Al doped ta-C films prepared by filtered cathodic vacuum arc

Structure and Tribological Properties of Ultra-Thin Tetrahedral Amorphous Carbon (ta-C) Films

Stress, Microstructure and Mechanical Properties of Graded Multilayer Tetrahedral Amorphous Carbon Films

Effect of structure on the secondary electron emission of tetrahedral amorphous carbon film

Influence of Substrate Bias on Properties of TiN Films with X-ray Photoelectron Spectroscopy and Atomic Force Microscopy Studies

Electronic Properties of Tetrahedral Amorphous Carbon (Ta-C) Films Containing Nanotube Regions