Preparation And Properties Of A Thermal Insulating Layer And A Buffer Layer For Multilayer Pyroelectric Film Infrared Detector

Xiaoqing Wu,Xi Yao,Minqiang Wang,Lumei Gao,Wei Ren

DOI: https://doi.org/10.1080/10584580390229833

2003-01-01

Integrated Ferroelectrics

Abstract:A thermal insulating layer and a buffer layer play a key role in the multilayer pyroelectric thin film infrared detector. In this work, a porous SiO2 film serving as thermal insulating layer and a dense SiO2 film serving as buffer layer were prepared by sol-gel method. The porosities of the porous film and the dense film are about 50% and 6%, respectively. Maximum thickness values of a single layer porous film and that of a single layer dense film all come up to 1.5 mum. Rms (root-mean-square) surface roughness of the porous film is about 40 nm and that of the dense film is about 1.5 nm. Experimental result shows 0.4 mum dense SiO2 film can flatten rough surface of the porous SiO2 film, and the rms surface roughness is less than 5 nm. The composite SiO2 film can effectively block thermal diffusion.