Hard antireflection coatings with enhanced mechanical properties based on gradient structure
Yusi Wang,Tingting Zheng,Pengyuan Wu,Chenying Yang,Oleksiy V. Penkov,Yujie Liu,Kaixin Yuan,Yan Cheng,Yueguang Zhang,Weidong Shen
DOI: https://doi.org/10.1016/j.tsf.2024.140545
IF: 2.1
2024-10-07
Thin Solid Films
Abstract:Antireflection (AR) coatings with sapphire-like hardness are highly desired in various applications. Traditionally, hard AR coatings resist penetration, scratching, and abrasion by depositing a hard layer, such as silicon nitride (Si 3 N 4 ), with a 1 to 2 μm thickness. However, thick Si 3 N 4 thin films, fabricated by high-energy inductively coupled plasma assisted (ICP-assisted) sputtering, often introduce high residual stress, leading to severe buckling problems when the surface is scratched. To address these challenges, we employ a "Step up-step down" design method, integrating a hardness gradient structure with a series of SiO x N y films. This approach achieves high optical transmittance (Tave > 98.7 % at 420–720 nm), low residual stress (∼680 MPa), improved scratch resistance, and strong adhesion at the film-substrate interface (L C3 ∼180 mN). Our findings demonstrate significant potential for various mechanical and optical applications, including automotive and consumer electronics devices.
materials science, multidisciplinary,physics, applied, condensed matter, coatings & films