La-Doped Effect On The Ferroelectric Properties Of Bi4ti3o12-Srbi4ti4o15 Thin Film Fabricated By Pulsed Laser Deposition

Hua Qin
DOI: https://doi.org/10.1063/1.1510557
IF: 2.877
2002-01-01
Journal of Applied Physics
Abstract:Bi4Ti3O12-SrBi4Ti4O15 (BT-SBTi) thin film was fabricated successfully on Pt/TiO2/SiO2/Si(110) substrates by the pulsed laser deposition technique. Films annealed at 650 degreesC by the rapid temperature process (RTP) have P-r=12 muC/cm(2). But, the fatigue behavior has been observed although no obvious decrease in P-r up to 10(5) s retained time in the BT-SBTi capacitor. After being La doped, the Bi3.25La0.75Ti3O12-SrBi4Ti4O15 (BLT-SBTi) has fatigue free properties. P-r=13.5 muC/cm(2) was measured in a BLT-SBTi film of 300 nm thickness. It did not show any significant fatigue up to 10(10) switching cycles above the applied field of 250 kV/cm. It also has good retention properties. The field dependence of fatigue behavior and La-doped effect are discussed. (C) 2002 American Institute of Physics.
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