Fabrication and characteristics of Au/PZT/p-Si ferroelectric memory diode

Hang Wang,Jun Yu,Xiaomin Dong,Wenli Zhou,Yunbo Wang,Jifan Xie
2001-01-01
Abstract:A ferroelectric memory diode that consists of Au/Pb(Zr0.52Ti0.48)O3/p-Si structure was fabricated by pulsed laser deposition technique. In the oxygen ambient of 13.3 Pa partial pressure, the PZT film was deposited on p-Si (100) at 350°C, then annealed at 530°C for 10 min. The PZT film with the thickness of 400 nm shows a saturated and asymmetric P-E hysteresis loop, and its remnant polarization and coercive field are 13 μC/cm2 and 48 kV/cm respectively. The leakage current of the fabricated diode is 3.9×10-6 A/cm2 at the bias voltage of +4 V. Both the C-V and I-V characteristics of the ferroelectric diode have hysteresis loops due to the ferroelectric remnant polarization, which indicates that the access function has been realized in the ferroelectric memory diode.
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