Preparation and Electrical Properties of Pt/Zro2/Si and Pt/Plzt/Zro2/Si Structures

C Ji,YY Lin,TA Tang
DOI: https://doi.org/10.1080/10584580500413392
2005-01-01
Integrated Ferroelectrics
Abstract:Pt/ZrO 2 /Si and Pt/PLZT/ ZrO 2 /Si ferroelectric diode structures Using ZrO 2 and PLZT(Pb 1.05 La 0.02 Zr 0.53 Ti 0.47 O 3 ) as dielectric and ferroelectric materials respectively are prepared in this work by CSD method. The P-E curves of PLZT film under different applied voltage are measured which show remnant polarization is about 10 mu C/cm 2 and coercive voltage is 1.5 V. The I-V curves of Pt/ZrO 2 /Si structure show low leakage current and moderately high breakdown electric field. The leakage current density under 1 MV/cm electrical field is 2.5 x 10 -5 A/cm 2 and the breakdown electrical field is about 8.2 MV/cm. The effects of applied voltage and ZrO 2 thickness on C-V curves are also investigated. The results indicate 1.5 V memory window under 9 V applied voltage. The I-V characteristic and current difference under "on and "off states of Pt/PLZT/ZrO 2 /Si MFIS structure are also discussed. After applied a writing voltage of +10 V for state "1 and -10 V for state "0, the read current difference is 0.2 mA under 4 V read voltage.
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