A Study of Electrical Properties on Nc-Si/c-si Heterojunction Diodes

YL He,YC Peng,MB Yu,M Liu,YX Li,GY Xu,JJ Luo,TM Wang
DOI: https://doi.org/10.1109/icsict.1998.786455
1998-01-01
Abstract:Nanocrystalline si(2) icon films on crystalline silicon diodes were fabricated and electrically characterized. The nc-Si:H film was deposited by plasma enhanced chemical vapor deposition. With the difference of the thickness of the nc-Si:H film and the doping type orthe c-Si substrata two kinds of diodes, tunneling diodes and heterojunction diodes, were formed. For the tunneling diode, resonant tunneling and quantum staircases Were observed in its I-V and sigma-V curves in liquid nitrogen temperature range (similar to 77K:). For heterojunction diode, we found some unique characters differing from other semiconductor heterojunctions. Both of these devices indicate quantum tunneling features in conduction mechanism.
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