Pulsed laser deposition technique and its applications in the study of functional thin films

Meiya Li,ZhongLie Wang,KuiXun Lin,GuangCheng Xiong,Shoushan Fan

1998-01-01

Abstract:Pulsed laser deposition is a new promising technique for the growth of thin films. The principle, characteristics and advantages of this technique were introduced. Its intensive applications in the study of functional thin films were reviewed.

What problem does this paper attempt to address?

Study on the optical thin film deposited by plasma ion plating

Xu Liu,Bin Wang,Peifu Gu,Jinfa Tang

1995-01-01

Abstract:A low-voltage plasma-ion-plating equipment was set up here based on the actions of plasma on the atoms or molecules of the evaporated materials during the film deposition, and a systematic research was carried out on both the conventional optical thin film materials (such as the sulphide, oxides) and the multilayer thin-film devices by using this equipment. The spectral transmittance, absorption, scattering and the packing density of the films were measured and analyzed. The experimental results show that this low-voltage plasma-ion-plating equipment can significantly improve both the optical and mechanical performances of the thin film deposited.
Pulsed Laser Deposition and Its Application in Magnetic Films

邓联文,江建军,何华辉

DOI: https://doi.org/10.3321/j.issn:1005-023x.2003.02.022

2003-01-01

Abstract:The pulsed laser deposition is a new technique for the growth of thin films.Its physical principle and unique characteristics and research progress in this area are introduced briefly.Preparation of magnetic films by PLD is also described.
Some Oxide-Films Deposited By Reactive Low-Voltage Plasma-Assisted Evaporation

xu liu,bin wang,gan wang,peifu gu,jinfa tang

DOI: https://doi.org/10.1117/12.163657

1993-01-01

Abstract:Low voltage plasma assisted evaporation (PAE) technique has been investigated as an effective evaporation technique for the deposition of oxide films of high optical performance. The PAE process consists of an electron beam evaporator and a large current plasma source. The guided wave method is used to measure the refractive index and attenuation coefficients of guided modes of some oxide films deposited by PEA. The experimental systems and results are presented.
A practical guide to pulsed laser deposition

Nick A. Shepelin,Zahra P. Tehrani,Natacha Ohannessian,Christof W. Schneider,Daniele Pergolesi,Thomas Lippert

DOI: https://doi.org/10.1039/d2cs00938b

IF: 46.2

2023-03-16

Chemical Society Reviews

Abstract:Nanoscale thin films are widely implemented across a plethora of technological and scientific areas, and form the basis for many advancements that have driven human progress, owing to the high degree of functional tunability based on the chemical composition. Pulsed laser deposition is one of the multiple physical vapour deposition routes to fabricate thin films, employing laser energy to eject material from a target in the form of a plasma. A substrate, commonly a single-crystal oxide, is placed in the path of the plume and acts as a template for the arriving species from the target to coalesce and self-assemble into a thin film. This technique is tremendously useful to produce crystalline films, due to the wide range of atmospheric conditions and the extent of possible chemical complexity of the target. However, this flexibility results in a high degree of complexity, oftentimes requiring rigorous optimisation of the growth parameters to achieve high quality crystalline films with desired composition. In this tutorial review, we aim to reduce the complexity and the barrier to entry for the controlled growth of complex oxides by pulsed laser deposition. We present an overview of the fundamental and practical aspects of pulsed laser deposition, discuss the consequences of tailoring the growth parameters on the thin film properties, and describe in situ monitoring techniques that are useful in gaining a deeper understanding of the properties of the resultant films. Particular emphasis is placed on the general relationships between the growth parameters and the consequent structural, chemical and functional properties of the thin films. In the final section, we discuss the open questions within the field and possible directions to further expand the utility of pulsed laser deposition.

chemistry, multidisciplinary
Pulsed Laser Deposition of Organic Thin Films

WANG Wei,LI Chengxiang,SHENG Liusi,ZHANG Guobin,WANG Shufen

DOI: https://doi.org/10.3321/j.issn:1005-023x.2007.01.012

2007-01-01

Abstract:Pulsed laser deposition (PLD) is a newly-rising technology for the deposition of thin films. Many satisfying findings have been achieved in the deposition and research of inorganic thin films. And the technology is sophisticated. However, it is only lately that the pulsed laser deposition and research of organic thin films began to develop. Little research has been done in this domain no systematic system is established. So the research on the pulsed laser deposition of organic thin films will be significant.
Advances in Research on Deposition Techniques for ZnO Thin Films

汪雷

DOI: https://doi.org/10.3321/j.issn:1005-023x.2002.09.012

2002-01-01

Abstract:Zinc oxide is a novel material for Ⅱ-Ⅵ semiconductor.A number of deposition techniques for ZnO thin films are now available,such as magnetron sputtering,spray pyrolysis,molecular beam epitaxy,pulsed laser deposition,metal-organic chemical vapor deposition and some novel growth technologies,including sol-gel,atomic layer epitaxy,chemical bath deposition,ion beam assisted deposition,successive ion layer adsorption and reactions,film oxidation,and so on.In this work,advances in research on deposition techniques for ZnO thin films are reviewed in detail.
Atomic Layer Deposition and Its Applications in Optical Thin Films

Junpeng He,ZhangYueguang,Weidong Shen,Xu Liu,Peifu Cu

DOI: https://doi.org/10.13922/j.cnki.cjovst.2009.02.005

2009-01-01

Abstract:The latest progress of atomic layer deposition (ALD) technology for optical coating was tentatively reviewed. First, the film growth conditions, including deposition rate, pressure and substrate temperature were compared with those of the conventional techniques. Besides, the advantages of the ALD technique, including good uniformity and high stability of the film, and easy control of the film thickness were introduced. Next, the influence of the precursors, especially for oxide films, on microstructures and optical properties was discussed. Finally, the strengths and weaknesses of the filters made of ALD films, including antireflection coating(AR), variable refractive index films, laser resistant coatings and ultraviolet (UV) blocking filters were discussed.
Recent progress in non-photolithographic patterning of polymer thin films

Mingjun Qiu,Weiwei Du,Shangyu Zhou,Pengzhe Cai,Yingwu Luo,Xiaoxue Wang,Rong Yang,Junjie Zhao

DOI: https://doi.org/10.1016/j.progpolymsci.2023.101688

IF: 31.281

2023-01-01

Progress in Polymer Science

Abstract:Patterned polymer thin films are essential components in many devices and applications owing to the multi-functionality, flexibility, lightweight and cost-efficiency. Unfortunately, conventional photolithography needs the use of developers and strippers which contain solvents and reagents that may dissolve, swell or degrade the polymer thin film substrates. Alternatively, non-photolithographic strategies provide alternative options and avoid the complicated optical systems, offering versatile routes for fabricating polymeric micro- and nanostructures. In this review, we summarize the recent progress in non-photolithographic patterning methods including soft lithography, nanoimprint lithography, direct writing, self-assembly of block copolymers, area-selective vapor phase deposition and instability induced patterning. These patterning approaches have been applied to various applications such as chromic devices, polymer light-emitting diodes, sensors, transistors, and protein and cellular engineering and many other scenarios. Finally, the subsisting challenges and future research directions of non-photolithographic patterning approaches are highlighted from the aspect of resolution, reliability and scalability.
Atomic layer deposition and other thin film deposition techniques: from principles to film properties

James A. Oke,Tien-Chien Jen

DOI: https://doi.org/10.1016/j.jmrt.2022.10.064

IF: 6.267

2022-11-02

Journal of Materials Research and Technology

Abstract:Thin film is a modern technology aimed at improving the structural, electrical, magnetic, optical, and mechanical properties of bulk materials. This technology has so far found applications in integrated circuits, semiconductor devices, transistors, light-emitting diodes, light crystal displays and photoconductors, rectifiers, solar cells, sensors, and micro-electromechanical systems (MEMS). Methods of thin film deposition such as physical and chemical vapor deposition (PVD and CVD), sputtering, spin and dip coatings, and spray pyrolysis have been utilized for several years. But in recent times, the atomic layer deposition (ALD) technique has attracted the attention of researchers. In this current review, we have explored the most used techniques in the depositions of thin film materials with a focus on the properties of film produced, and the advantages and disadvantages of each technique. Generally, it was observed that the quality of films produced by these techniques depends greatly on the choice of substrate, deposition temperature, temperature window, and precursor used. It concluded by identifying ALD as an optimum technique in depositing ultra-thin film materials due to its simplicity, reproducibility, control over film composition and thickness, and high conformal deposited films at the atomic level. This study has established the opportunity for upcoming researchers to have an insight of selecting the most suitable technique for their study in various fields of research. Finally, the challenges and future perspectives of deposition techniques were highlighted.

materials science, multidisciplinary,metallurgy & metallurgical engineering
Growth and Magnetism of Metallic Thin Films and Multilayers by Pulsed-Laser Deposition

J Shen,Z Gai,J Kirschner

DOI: https://doi.org/10.1016/j.surfrep.2003.10.001

IF: 13.417

2004-01-01

Surface Science Reports

Abstract:Pulsed-laser deposition (PLD) is a powerful method to grow thin films and multilayers of complex materials such as transition metal oxides. In this case, the most cited advantage of PLD is the simplicity of preserving the stoichiometry of the target material. Recently, there are many reports showing that PLD can significantly improve the growth of even simple metallic thin films/multilayers. Here it is the ultrahigh instantaneous deposition rate and the high kinetic energy of PLD that play the most crucial roles. The improved growth, in particular for the first several monolayers, provides great opportunities to design artificial thin film structures that have promising physical properties.
Recent Advances on Pulsed Laser Deposition of Large‐Scale Thin Films

Jing Yu,Wei Han,Abdulsalam Aji Suleiman,Siyu Han,Naihua Miao,Francis Chi‐Chung Ling

DOI: https://doi.org/10.1002/smtd.202301282

IF: 12.4

2023-12-13

Small Methods

Abstract:Pulsed laser deposition (PLD) is an impactful method for wafer‐scale growth of 2D films, owing to target‐maintained stoichiometry, high growth rate, and efficiency. In this review, the recent advances on the PLD fabrication of 2D films, including the growth mechanisms, strategies, and materials classification are summarized. First, efficacious strategies of PLD growth are highlighted. Then, the growth, characterization, and device applications of various 2D films, like graphene, h‐BN, MoS2, BP, oxide, perovskite, semi‐metal etc, are presented. Finally, the potential challenges and further research directions of PLD technique is envisioned. 2D thin films, possessing atomically thin thickness, are emerging as promising candidates for next‐generation electronic devices, due to their novel properties and high performance. In the early years, a wide variety of 2D materials are prepared using several methods (mechanical/liquid exfoliation, chemical vapor deposition, etc.). However, the limited size of 2D flakes hinders their fundamental research and device applications, and hence the effective large‐scale preparation of 2D films is still challenging. Recently, pulsed laser deposition (PLD) has appeared to be an impactful method for wafer‐scale growth of 2D films, owing to target‐maintained stoichiometry, high growth rate, and efficiency. In this review, the recent advances on the PLD preparation of 2D films are summarized, including the growth mechanisms, strategies, and materials classification. First, efficacious strategies of PLD growth are highlighted. Then, the growth, characterization, and device applications of various 2D films are presented, such as graphene, h‐BN, MoS2, BP, oxide, perovskite, semi‐metal, etc. Finally, the potential challenges and further research directions of PLD technique is envisioned.

materials science, multidisciplinary,chemistry, physical,nanoscience & nanotechnology
A review on diamond-like carbon films grown by pulsed laser deposition

Yimin Lu,Guojun Huang,Sai Wang,Chaowei Mi,Shangfang Wei,Fangtao Tian,Wei Li,Haiyuan Cao,Yong Cheng

DOI: https://doi.org/10.1016/j.apsusc.2020.148573

IF: 6.7

2021-03-01

Applied Surface Science

Abstract:Pulsed laser deposition is an excellent technology for growing diamond-like carbon films. It can provide sufficient ion energy at a low temperature to achieve the desired compound or doped coating during the deposition process. This review discusses the influence of the dominant laser parameters, ambient gas, and substrate-target conditions on the various properties of diamond-like carbon films by arranging the data reported in the last decade. Details of the basic and advanced pulsed laser deposition processes used to grow diamond-like carbon coatings are reviewed, and the highly adhesive diamond-like carbon film deposited by advanced pulsed laser deposition is emphasized. The excellent protective performance of diamond-like carbon films prepared by pulsed laser deposition is attributed to their high hardness, chemical inertness, low friction, and superior wear resistance, leading to applications in the fields of tribology, mechanics, medicine, and optics. Double laser beam deposition, hybrid pulsed laser deposition, and ion management in a magnetic field, which represent the development of pulsed laser deposition, are also discussed. This review is expected to offer assistance and inspiration to researchers engaged in the growth of diamond-like carbon films.

chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
A New Reactive Pulsed Laser Ablation Technique for the Deposition of Hard Carbon and Carbon-Nitride Thin Films

I Alexandrou,I Zergioti,GAJ Amaratunga,MJF Healy,CJ Kiely,P Hatto,M Velegrakis,C Fotakis

DOI: https://doi.org/10.1016/s0167-577x(98)00223-7

IF: 3

1999-01-01

Materials Letters

Abstract:A new configuration of the pulsed laser deposition (PLD) technique for improving the growth of thin films in a gas ambient is described. A nozzle arrangement is used to create high pressure N2 and He pulses in the region above an ablated carbon target for the formation of C:N and C thin films. Films deposited by both the standard and the new configuration are compared in terms of their mechanical properties, nitrogen concentration and microstructure. When the standard configuration is used, the maximum values attained for the nitrogen concentration and film microhardness are 32.25% and 13 GPa, respectively. When the pulsed N2 nozzle configuration is used, the nitrogen concentration (30.58%) is almost equal to the highest value attained with the standard configuration but the film microhardness is higher (15.8 GPa). When the He nozzle is used the film microhardness increases further, up to a value of 34 GPa. Interestingly, the elastic recovery of most films reaches relatively high values, between 60% and 70%. In all cases the films are amorphous and macroparticle inclusions are observed.
Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure

Chunrui Ma,Chonglin Chen

DOI: https://doi.org/10.1002/9783527696406.ch1

2016-01-01

Abstract:Chapter 1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure Chunrui Ma, Chunrui Ma Xi'an Jiaotong University, School of Materials Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, No.28, Xianning West Road, Xi'an, Shaanxi, 710049 P. R. ChinaSearch for more papers by this authorChonglin Chen, Chonglin Chen University of Texas at San Antonio, Department of Physics and Astronomy, One UTSA Circle, San Antonio, TX 78249 USASearch for more papers by this author Chunrui Ma, Chunrui Ma Xi'an Jiaotong University, School of Materials Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, No.28, Xianning West Road, Xi'an, Shaanxi, 710049 P. R. ChinaSearch for more papers by this authorChonglin Chen, Chonglin Chen University of Texas at San Antonio, Department of Physics and Astronomy, One UTSA Circle, San Antonio, TX 78249 USASearch for more papers by this author Book Editor(s):Yuan Lin, Yuan Lin University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin films and Integrated Devices, No. 4, Section 2, North Jianshe Road, Chengdu, Sichuan, 610054 PR ChinaSearch for more papers by this authorXin Chen, Xin Chen East China University of Science and Technology, 130 Meilong Road, 200237 Shanghai, ChinaSearch for more papers by this author First published: 08 September 2016 https://doi.org/10.1002/9783527696406.ch1Citations: 4 AboutPDFPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShareShare a linkShare onFacebookTwitterLinked InRedditWechat Summary Pulsed laser deposition (PLD) is one of the most promising techniques for the formation of complex-oxide heterostructures and nanostructure due to its simple setup and it can stoichiometrically transfer a material from a solid source to a substrate to form its thin film. This chapter details the PLD setup and focus primarily on operating principle, growth mechanism and parameter of PLD for complex oxide thin film and nanostructure. Citing Literature Advanced Nano Deposition Methods RelatedInformation
Processing and Characterization of Ta2O5 Films Deposited by Pulsed Laser Ablation

Qi‐Zong Qin,Zheng‐Wen Fu

DOI: https://doi.org/10.1002/(sici)1521-4095(199909)11:13<1119::aid-adma1119>3.3.co;2-2

IF: 29.4

1999-01-01

Advanced Materials

Abstract:A versatile, environmentally friendly metal oxide deposition technique—pulsed laser ablation—is described for the fabrication of thin films of Ta2O5. This technique is reported to have several advantages over other deposition methods (such as chemical vapor deposition and magnetron sputtering), for instance, a high instantaneous rate of deposition with tight control over the film thickness and transfer of the original stoichiometry. In its thin-film form Ta2O5 is a promising material for the fabrication of antireflection coatings and oxygen sensors, among other applications.
Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition

G. Carnide,C. Simonnet,D. Parmar,Z. Zavvou,H. Klein,R. Conan,V. Pozsgay,T. Verdier,C. Villeneuve-Faure,M. L. Kahn,L. Stafford,R. Clergereaux

DOI: https://doi.org/10.1007/s11090-024-10455-x

2024-03-14

Plasma Chemistry and Plasma Processing

Abstract:Plasma-enhanced chemical vapor deposition is a well-developed technique that is commonly applied in the preparation of thin films. However, this technique is limited to thermodynamically stable and chemically inert precursor gases or vapors. Recently, pulsed aerosol-assisted plasma processes have emerged as an advantageous alternative that allows for the injection of various liquid solutions in the plasma, regardless of their properties. This study examines the production of thin films by pulsed injection of pentane aerosols into a low-pressure RF capacitively coupled plasma. This technique produces thin films with high material balance and a high degree of control by adjusting the pulsed injection parameters. At the pulse scale, pulsed injection induces a temporary increase in the working pressure, resulting in time-dependent mechanisms that can affect the dynamics of thin-film deposition at the process scale. Overall, the results show a key role of droplets and their kinetics (ballistic transport, vaporization kinetics, electrostatic confinement). Hence, to efficiently apply this method in the preparation of (multi-)functional coatings, the aerosol must be carefully characterized.

engineering, chemical,physics, fluids & plasmas, applied
Interactions Between Pulsed Laser-Induced Plasma and Ecr Microwave Plasma

Junyi Tang,Jian Sun,Hao Wang,Jie Shao,Hao Ling,Xiaokang Shen,Jiada Wu,Yongfeng Lu

DOI: https://doi.org/10.1117/12.762277

2008-01-01

Abstract:Pulsed-laser deposition (PLD) is a versatile technique for thin film deposition. The generation and propagation of laser-induced plasmas have been extensively studied. Other plasma sources have been combined with PLD to improve the film qualities. The knowledge about the interactions between the laser-induced plasmas and additional plasmas and their effects on film growth is still limited. We have investigated the optical emission spectra from the interaction region of low-pressure ECR microwave plasmas and pulsed-laser-induced plasmas. In this region, the spatial and temporal distributions of the laser-ablated species were altered while very few collisions were expected in the ambient gas due to the low pressure. The results were compared with those with laser ablation or ECR microwave discharge along. The mechanisms and effects of the interactions were discussed.
Electron Cyclotron Resonance Plasma-assisted Reactive Pulsed Laser Deposition of Compound Films

Sun J,Wu J. D.,Ling H.,Shi W.,Ying Z. F.,Li F. M.

DOI: https://doi.org/10.1557/jmr.2002.0249

2002-01-01

Abstract:A novel method was developed for low-temperature preparation of thin films. Pulsed laser ablation was combined with electron cyclotron resonance microwave discharge, constituting a novel hybrid film preparation method called electron cyclotron resonance plasma–assisted reactive pulsed laser deposition. We demonstrated the feasibility of the method by preparing compound films of silicon nitride, silicon dioxide, and aluminum nitride from elemental starting materials. The mechanisms responsible for efficient compound formation and film growth are discussed, together with characterization of the prepared films, analysis of the plasma composition, and comparison of the films prepared with and without assistance of the plasma. The unique features of the method make it suitable for one-step preparation of compound thin films at low temperatures.
Principle and Applications of Plasma Enhanced Atomic Layer Deposition

Cao Yanqiang,Li Aidong

DOI: https://doi.org/10.3969/j.issn.1671-4776.2012.07.011

2012-01-01

Abstract:Plasma enhanced atomic layer deposition(PEALD) is an efficient method for the pre-paration of high-quality ultra-thin films at low temperature,and has drawn great attention from industry and research fields in recent years.The development history and principle of the PEALD are introduced briefly.Three equipment configurations are described,including the radical-enhanced ALD,direct plasma ALD and remote plasma ALD,and their advantages and disadvantages are compared.The characteristics of PEALD are mainly reviewed,such as low deposition temperature,more choices of precursors and materials,flexible processing conditions and good film properties.However,it also faces some challenges from reduced film conformality and plasma damage.Several important applications of PEALD are reviewed,including the metal film deposition,Cu interconnection barrier layer,high dielectric constant materials,and encapsulation.Finally,the development prospects of PEALD are presented.
Micro-nano structured functional coatings deposited by liquid plasma spraying

Yuchun Huan,Kaidi Wu,Changjiu Li,Hanlin Liao,Marc Debliquy,Chao Zhang

DOI: https://doi.org/10.1007/s40145-020-0402-9

IF: 11.534

2020-08-10

Journal of Advanced Ceramics

Abstract:Abstract Inspired by the micro-nano structure on the surface of biological materials or living organisms, micro-nano structure has been widely investigated in the field of functional coatings. Due to its large specific surface area, porosity, and dual-scale structure, it has recently attracted special attention. The typical fabrication processes of micro-nano structured coatings include sol-gel, hydrothermal synthesis, chemical vapor deposition, etc. This paper presents the main features of a recent deposition and synthesis technique, liquid plasma spraying (LPS). LPS is an important technical improvement of atmospheric plasma spraying. Compared with atmospheric plasma spraying, LPS is more suitable for preparing functional coatings with micro-nano structure. Micro-nano structured coatings are mainly classified into hierarchical-structure and binary-structure. The present study reviews the preparation technology, structural characteristics, functional properties, and potential applications of LPS coatings with a micro-nano structure. The micro-nano structured coatings obtained through tailoring the structure will present excellent performances.

materials science, ceramics

Pulsed laser deposition technique and its applications in the study of functional thin films

Study on the optical thin film deposited by plasma ion plating

Pulsed Laser Deposition and Its Application in Magnetic Films

Some Oxide-Films Deposited By Reactive Low-Voltage Plasma-Assisted Evaporation

A practical guide to pulsed laser deposition

Pulsed Laser Deposition of Organic Thin Films

Advances in Research on Deposition Techniques for ZnO Thin Films

Atomic Layer Deposition and Its Applications in Optical Thin Films

Recent progress in non-photolithographic patterning of polymer thin films

Atomic layer deposition and other thin film deposition techniques: from principles to film properties

Growth and Magnetism of Metallic Thin Films and Multilayers by Pulsed-Laser Deposition

Recent Advances on Pulsed Laser Deposition of Large‐Scale Thin Films

A review on diamond-like carbon films grown by pulsed laser deposition

A New Reactive Pulsed Laser Ablation Technique for the Deposition of Hard Carbon and Carbon-Nitride Thin Films

Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure

Processing and Characterization of Ta2O5 Films Deposited by Pulsed Laser Ablation

Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition

Interactions Between Pulsed Laser-Induced Plasma and Ecr Microwave Plasma

Electron Cyclotron Resonance Plasma-assisted Reactive Pulsed Laser Deposition of Compound Films

Principle and Applications of Plasma Enhanced Atomic Layer Deposition

Micro-nano structured functional coatings deposited by liquid plasma spraying