Pulsed Laser Deposition and Its Application in Magnetic Films

邓联文,江建军,何华辉

DOI: https://doi.org/10.3321/j.issn:1005-023x.2003.02.022

2003-01-01

Abstract:The pulsed laser deposition is a new technique for the growth of thin films.Its physical principle and unique characteristics and research progress in this area are introduced briefly.Preparation of magnetic films by PLD is also described.

What problem does this paper attempt to address?

Research Progress of Magnetic Fluids

王晨,胡军,罗伟,严密

DOI: https://doi.org/10.3969/j.issn.1005-8192.2003.04.010

2003-01-01

Abstract:The research progress of magnetic fluids is reviewed.The theory,classification and preparation approaches of magnetic fluids are systematically introduced.On the basis of the above the properties and practical applications are discussed.Particular attention goes to the advantages and drawbacks of preparations and the applications in the fields of industrial sealing and biotechnology.
Optical-Electric Thin Films Produced By Low Voltage Reactive Plasma Assisted Deposition

X Liu,B Wang,Pf Gu,Jf Tang

DOI: https://doi.org/10.1117/12.192171

1994-01-01

Abstract:Low voltage reactive plasma assisted deposition (RPAD) is used here, to deposit the optical- electric films, such as transparent conductive thin films and Si3N4 films. Comparing to other thermal evaporation techniques, RPAD can produce more easily such kind of opto- electric thin films. Experimental results of the films deposited will be presented in this paper.
Growth and Magnetism of Metallic Thin Films and Multilayers by Pulsed-Laser Deposition

J Shen,Z Gai,J Kirschner

DOI: https://doi.org/10.1016/j.surfrep.2003.10.001

IF: 13.417

2004-01-01

Surface Science Reports

Abstract:Pulsed-laser deposition (PLD) is a powerful method to grow thin films and multilayers of complex materials such as transition metal oxides. In this case, the most cited advantage of PLD is the simplicity of preserving the stoichiometry of the target material. Recently, there are many reports showing that PLD can significantly improve the growth of even simple metallic thin films/multilayers. Here it is the ultrahigh instantaneous deposition rate and the high kinetic energy of PLD that play the most crucial roles. The improved growth, in particular for the first several monolayers, provides great opportunities to design artificial thin film structures that have promising physical properties.
Pulsed laser deposition technique and its applications in the study of functional thin films

Meiya Li,ZhongLie Wang,KuiXun Lin,GuangCheng Xiong,Shoushan Fan

1998-01-01

Abstract:Pulsed laser deposition is a new promising technique for the growth of thin films. The principle, characteristics and advantages of this technique were introduced. Its intensive applications in the study of functional thin films were reviewed.
Pulsed Laser Deposition of Diamond-Like Carbon Films under a Magnetic Field

QR Hou,J Gao

DOI: https://doi.org/10.1088/0953-8984/9/47/003

1997-01-01

Journal of Physics Condensed Matter

Abstract:Pulsed laser deposition of diamond-like carbon films under a magnetic field has been studied. The magnetic field with its direction parallel to the surfaces of substrate and target can significantly enlarge the volume of green plume, and hence improve the uniformity. It has been found that not only the uniformity of thickness but also the hardness of films grown by this method were greatly improved. These diamond-like carbon films were analysed by atomic force microscopy and micro-hardness measurements. The root-mean-squared surface roughness of the films was about 0.265 nm. The hardness of films made by this technique can reach up to .
Diamond-Like Carbon Thin-Film Deposition Using A Magnetically Confined Rf Pecvd System

S.R.P. Silva,K.J. Clay,S.P. Speakman,G.A.J. Amaratunga

DOI: https://doi.org/10.1016/0925-9635(94)00266-5

IF: 3.806

1995-01-01

Diamond and Related Materials

Abstract:Diamond-like carbon thin films have been deposited at low temperatures, using local magnetic confinement in a r.f.-powered plasma-enhanced chemical vapour deposition process. The increased plasma density and temperature obtained by magnetically confining the plasma, increases the ionization of the hydrocarbon gas in the deposition chamber. The modified plasma is characterized together with the material properties of the deposited films. A model is proposed to explain the dissociation of species in the plasma and the plasma temperature based on the observed results. Doping of the films using nitrogen gas fed in with the hydrocarbon is also investigated.
High‐Quality NiFe Thin Films on Oxide/Non‐Oxide Platforms via Pulsed Laser Deposition at Room Temperature

Hong Yan,Ganesh Ji Omar,Zhaoting Zhang,Zhi Shiuh Lim,A. Ariando

DOI: https://doi.org/10.1002/admi.202300265

IF: 5.4

2024-01-12

Advanced Materials Interfaces

Abstract:High‐quality NiFe thin films with desirable magnetic properties are deposited on oxide and non‐oxide substrates using pulsed laser deposition (PLD) at room temperature. The structure, magnetic properties, and magnetodynamics characterizations are studied, with their dependence on laser fluence, substrate and thickness analyzed. These findings offer significant insights into the development of thin NiFe films through PLD. Soft ferromagnetic permalloy (NiFe) thin films are promising for applications in spintronic devices because of their constituent electrical and magnetic properties. Electron beam evaporation and sputtering techniques have been used to deposit NiFe thin films. For in situ stacking of NiFe with functional complex oxides, the pulsed laser deposition (PLD) method is highly desirable. However, the growth of high‐quality NiFe (and non‐oxide thin films in general) by PLD remains a formidable task. Here, high‐quality NiFe thin films of various thicknesses on oxide/non‐oxide substrates with desirable magnetic properties by PLD at room temperature are reported. The magnetic properties are found to be strongly dependent on the laser fluence of the deposition process. The laser fluence of 4 J cm−2 produces the highest magnetization of ≈547 emu cc−1. The small coercivity (few Oersted) and sharp ferromagnetic switching behavior indicate uniaxial anisotropy with an easy axis along the in‐plane direction. In addition, thickness‐dependent magnetodynamics characterizations are studied via ferromagnetic resonance. These results offer significant insight into the PLD‐based development of thin metal magnetic films.

materials science, multidisciplinary,chemistry
Pulsed Laser Deposition of Organic Thin Films

WANG Wei,LI Chengxiang,SHENG Liusi,ZHANG Guobin,WANG Shufen

DOI: https://doi.org/10.3321/j.issn:1005-023x.2007.01.012

2007-01-01

Abstract:Pulsed laser deposition (PLD) is a newly-rising technology for the deposition of thin films. Many satisfying findings have been achieved in the deposition and research of inorganic thin films. And the technology is sophisticated. However, it is only lately that the pulsed laser deposition and research of organic thin films began to develop. Little research has been done in this domain no systematic system is established. So the research on the pulsed laser deposition of organic thin films will be significant.
Micro-structural and Optical Properties of Diamond-like Carbon Films Grown by Magnetic field-assisted Laser Deposition

Lu Yimin,Wang Yujie,Xu manman,Wang Hai,Xi Lin,

DOI: https://doi.org/10.7498/aps.73.20240145

IF: 0.906

2024-01-01

Acta Physica Sinica

Abstract:Inhomogeneous magnetic field was introduced into pulsed laser deposition process, in order to discover new properties of diamond-like carbon film grown under magnetic field, offering the theoretical and experimental basis for furtherly enhancing sp 3 -bond content in this film. Distribution of the magnetic strength and flux lines induced by a rectangular permanent magnet was calculated. And then, flying trace of the carbon ions in the magnetic field was also simulated by the iterative method, which indicated that the carbon ions could not expand freely and they were restrained to accumulate around the center region of the magnet source. Besides the surface interference, measurement and the fitted results of ellipsometry parameters showed that magnetic field had important influence on layer-thickness distribution and optical constant of the pulsed laser deposition-grown diamond-like carbon film. Meanwhile, it was indicated that inhomogeneity of the layer-thickness distribution and optical constant increased when the magnetic strength was higher. Micro-structure of diamond-like carbon film was affected seriously by magnetic field, which was indicated by Raman spectra. Magnetic field could enhance the local stress in the carbon matrix net, increasing the sp 3 -bond content. Theoretical and experimental research showed that a suitable magnetic strength could excite micro-structure of diamond-like carbon film significantly, however, the high-quality diamond-like carbon coating with practical application value would be obtained by technological adjustment.

physics, multidisciplinary
A New Reactive Pulsed Laser Ablation Technique for the Deposition of Hard Carbon and Carbon-Nitride Thin Films

I Alexandrou,I Zergioti,GAJ Amaratunga,MJF Healy,CJ Kiely,P Hatto,M Velegrakis,C Fotakis

DOI: https://doi.org/10.1016/s0167-577x(98)00223-7

IF: 3

1999-01-01

Materials Letters

Abstract:A new configuration of the pulsed laser deposition (PLD) technique for improving the growth of thin films in a gas ambient is described. A nozzle arrangement is used to create high pressure N2 and He pulses in the region above an ablated carbon target for the formation of C:N and C thin films. Films deposited by both the standard and the new configuration are compared in terms of their mechanical properties, nitrogen concentration and microstructure. When the standard configuration is used, the maximum values attained for the nitrogen concentration and film microhardness are 32.25% and 13 GPa, respectively. When the pulsed N2 nozzle configuration is used, the nitrogen concentration (30.58%) is almost equal to the highest value attained with the standard configuration but the film microhardness is higher (15.8 GPa). When the He nozzle is used the film microhardness increases further, up to a value of 34 GPa. Interestingly, the elastic recovery of most films reaches relatively high values, between 60% and 70%. In all cases the films are amorphous and macroparticle inclusions are observed.
Recent Advances on Pulsed Laser Deposition of Large‐Scale Thin Films

Jing Yu,Wei Han,Abdulsalam Aji Suleiman,Siyu Han,Naihua Miao,Francis Chi‐Chung Ling

DOI: https://doi.org/10.1002/smtd.202301282

IF: 12.4

2023-12-13

Small Methods

Abstract:Pulsed laser deposition (PLD) is an impactful method for wafer‐scale growth of 2D films, owing to target‐maintained stoichiometry, high growth rate, and efficiency. In this review, the recent advances on the PLD fabrication of 2D films, including the growth mechanisms, strategies, and materials classification are summarized. First, efficacious strategies of PLD growth are highlighted. Then, the growth, characterization, and device applications of various 2D films, like graphene, h‐BN, MoS2, BP, oxide, perovskite, semi‐metal etc, are presented. Finally, the potential challenges and further research directions of PLD technique is envisioned. 2D thin films, possessing atomically thin thickness, are emerging as promising candidates for next‐generation electronic devices, due to their novel properties and high performance. In the early years, a wide variety of 2D materials are prepared using several methods (mechanical/liquid exfoliation, chemical vapor deposition, etc.). However, the limited size of 2D flakes hinders their fundamental research and device applications, and hence the effective large‐scale preparation of 2D films is still challenging. Recently, pulsed laser deposition (PLD) has appeared to be an impactful method for wafer‐scale growth of 2D films, owing to target‐maintained stoichiometry, high growth rate, and efficiency. In this review, the recent advances on the PLD preparation of 2D films are summarized, including the growth mechanisms, strategies, and materials classification. First, efficacious strategies of PLD growth are highlighted. Then, the growth, characterization, and device applications of various 2D films are presented, such as graphene, h‐BN, MoS2, BP, oxide, perovskite, semi‐metal, etc. Finally, the potential challenges and further research directions of PLD technique is envisioned.

materials science, multidisciplinary,chemistry, physical,nanoscience & nanotechnology
High-quality NiFe thin films on oxide/non-oxide platforms via pulsed laser deposition at room temperature

H. Yan,G. J. Omar,Z. T. Zhao,Lim Zhi Shiuh,A. Ariando

2023-04-02

Abstract:Soft ferromagnetic NiFe thin films are promising for applications in spintronic devices because of their constituent electrical and magnetic properties. Electron beam evaporation and sputtering techniques have been used to deposit NiFe thin films. For in-situ stacking of NiFe with functional complex oxides, the pulsed laser deposition (PLD) method is highly desirable. However, the growth of high-quality NiFe (and non-oxide thin films in general) by PLD remains a formidable task. Here, we report high-quality NiFe thin films of various thicknesses on oxide/non-oxide substrates with desirable magnetic properties by PLD at room temperature. The magnetic properties are found to be strongly dependent on the laser fluence of the deposition process. The laser fluence of 4 Joule/cm$^2$ produces the highest magnetization of ~547 emu/cc. The small coercivity (few Oersted) and sharp ferromagnetic switching behaviour indicate uniaxial anisotropy with an easy axis along the in-plane direction. In addition, thickness-dependent magnetodynamics characterizations are studied via ferromagnetic resonance. Our findings indicate the ferromagnetic characteristics are sensitive to the quality of the oxide/non-oxide substrate surface. These results offer significant insight into the PLD-based development of thin metal magnetic films.

Materials Science,Strongly Correlated Electrons
Structure and Magnetism of Pulsed-Laser-deposited Ultrathin Films of Fe on Cu(100)

H Jenniches,J Shen,CV Mohan,SS Manoharan,J Barthel,P Ohresser,M Klaua,J Kirschner

DOI: https://doi.org/10.1103/physrevb.59.1196

1999-01-01

Abstract:A layer-by-layer growth of ultrathin films right from the beginning would be desirable for establishing a straightforward correlation between magnetism and structure. We give experimental evidence that with the help of pulsed laser deposition (PLD) we can achieve layer-by-layer growth for Fe on Cu(100) in contrast to deposition by molecular-beam epitaxy. We present the results of a comprehensive study of the structural and magnetic properties of PLD-grown ultrathin Fe films of thicknesses between 2 and 10 monolayers (ML) deposited at room temperature. We show scanning tunneling microscopy images and low-energy electron-diffraction (LEED) patterns as well as intensity vs energy (IV) LEED curves demonstrating that PLD-grown Fe/Cu(100) has an isotropic fee structure. We characterize the magnetic properties of our films by the magnetooptical Ken effect. Following the improved growth and morphology, we found strong differences in the magnetic behavior of these films in comparison with Fe thermally deposited onto Cu(100): PLD-grown ultrathin Fe/Cu(100) shows an in-plane easy axis of magnetization in the thickness range 2-5 ML and again from about 10 ML. where the film structure is dominated by the bcc-Fe bulk phase, while there is a perpendicular easy axis of magnetization between 7 and 10 ML coverage. These results are discussed in terms of the different growth and structure due to the characteristic features of the PLD technique. [S0163-1829(99)13201-6].
Growth, Structure, and Magnetism of Fcc Fe Ultrathin Films on Cu(111) by Pulsed Laser Deposition

P Ohresser,J Shen,J Barthel,M Zheng,CV Mohan,M Klaua,J Kirschner

DOI: https://doi.org/10.1103/physrevb.59.3696

IF: 3.7

1999-01-01

Physical Review B

Abstract:Ultrathin Fe films on Cu(111) have been grown by pulsed-laser deposition (PLD) whose instantaneous deposition rate is about six orders of magnitude larger than that of the conventional molecular-beam epitaxy based on thermal deposition (TD). Compared to the TD prepared Fe/Cu(111) films, the PLD films have a significantly improved layer-by-layer morphology and a substantially enhanced stability of the fee phase as characterized by scanning tunneling microscopy and electron-diffraction techniques. The magnetic properties of the PLD films, investigated by magneto-optical Kerr effect, also show remarkably different behavior as compared to the TD films. At low thickness (<3 ML), while the TD films are characterized by a low net moment and a short-range ferromagnetic order, the PLD films show a high net moment with a true long-range ferromagnetic order. Above 3 hit both PLD and TD films undergo a magnetic transition though with apparently different structural origin. We discuss these results based on the different growth and structure between the PLD and TD grown Fe films. [S0163-1829(99)02802-7].
A practical guide to pulsed laser deposition

Nick A. Shepelin,Zahra P. Tehrani,Natacha Ohannessian,Christof W. Schneider,Daniele Pergolesi,Thomas Lippert

DOI: https://doi.org/10.1039/d2cs00938b

IF: 46.2

2023-03-16

Chemical Society Reviews

Abstract:Nanoscale thin films are widely implemented across a plethora of technological and scientific areas, and form the basis for many advancements that have driven human progress, owing to the high degree of functional tunability based on the chemical composition. Pulsed laser deposition is one of the multiple physical vapour deposition routes to fabricate thin films, employing laser energy to eject material from a target in the form of a plasma. A substrate, commonly a single-crystal oxide, is placed in the path of the plume and acts as a template for the arriving species from the target to coalesce and self-assemble into a thin film. This technique is tremendously useful to produce crystalline films, due to the wide range of atmospheric conditions and the extent of possible chemical complexity of the target. However, this flexibility results in a high degree of complexity, oftentimes requiring rigorous optimisation of the growth parameters to achieve high quality crystalline films with desired composition. In this tutorial review, we aim to reduce the complexity and the barrier to entry for the controlled growth of complex oxides by pulsed laser deposition. We present an overview of the fundamental and practical aspects of pulsed laser deposition, discuss the consequences of tailoring the growth parameters on the thin film properties, and describe in situ monitoring techniques that are useful in gaining a deeper understanding of the properties of the resultant films. Particular emphasis is placed on the general relationships between the growth parameters and the consequent structural, chemical and functional properties of the thin films. In the final section, we discuss the open questions within the field and possible directions to further expand the utility of pulsed laser deposition.

chemistry, multidisciplinary
Interactions Between Pulsed Laser-Induced Plasma and Ecr Microwave Plasma

Junyi Tang,Jian Sun,Hao Wang,Jie Shao,Hao Ling,Xiaokang Shen,Jiada Wu,Yongfeng Lu

DOI: https://doi.org/10.1117/12.762277

2008-01-01

Abstract:Pulsed-laser deposition (PLD) is a versatile technique for thin film deposition. The generation and propagation of laser-induced plasmas have been extensively studied. Other plasma sources have been combined with PLD to improve the film qualities. The knowledge about the interactions between the laser-induced plasmas and additional plasmas and their effects on film growth is still limited. We have investigated the optical emission spectra from the interaction region of low-pressure ECR microwave plasmas and pulsed-laser-induced plasmas. In this region, the spatial and temporal distributions of the laser-ablated species were altered while very few collisions were expected in the ambient gas due to the low pressure. The results were compared with those with laser ablation or ECR microwave discharge along. The mechanisms and effects of the interactions were discussed.
Effect of Magnetic Field Type on the Flight State of Supersonic Plasma Spray Particles and Coating Properties

Jiaxin Song,Dongyu He,Weiling Guo,Yanfei Huang,Zhixiong Li,Haidou Wang,Zhiguo Xing

DOI: https://doi.org/10.1007/s11666-023-01581-7

IF: 2.839

2023-04-26

Journal of Thermal Spray Technology

Abstract:This paper aims to demonstrate the feasibility and effectiveness of using magnetic fields in the preparation of coatings. To achieve this, we have combined supersonic plasma spraying technology with a magnetic field to produce coatings that perform better. Specifically, we have prepared NiCrBSi-10%WC&Co coatings using supersonic plasma spraying under three conditions: no magnetic field, pulsed magnetic field, and constant magnetic field. In this study, we have compared and analyzed the droplet flight progression, coating morphology, coating micromorphology, and mechanical properties of the coatings under these three conditions. When both melted and unmelted particles spread over the matrix, broken edges appear. However, we found that the magnetic field can affect the magnitude and direction of the droplet velocity upon impact on the matrix. Additionally, the cross-sectional morphology of the coatings shows that the reinforcement aggregates due to the magnetic field's promotion of internal flow during coating solidification. Further, our transmission electron microscopy analysis revealed that the magnetic field caused grain refinement. Moreover, we observed that the grain refinement effect was more significant under a constant magnetic field than under a pulsed magnetic field. Due to the growth of spreading morphology, enhanced phase aggregation, and fine-grain structure, the coatings produced in a magnetic field exhibited higher microhardness and adhesion properties. Overall, our results suggest that using magnetic fields in the preparation of coatings can significantly improve their performance.

materials science, coatings & films
Principle and Applications of Plasma Enhanced Atomic Layer Deposition

Cao Yanqiang,Li Aidong

DOI: https://doi.org/10.3969/j.issn.1671-4776.2012.07.011

2012-01-01

Abstract:Plasma enhanced atomic layer deposition(PEALD) is an efficient method for the pre-paration of high-quality ultra-thin films at low temperature,and has drawn great attention from industry and research fields in recent years.The development history and principle of the PEALD are introduced briefly.Three equipment configurations are described,including the radical-enhanced ALD,direct plasma ALD and remote plasma ALD,and their advantages and disadvantages are compared.The characteristics of PEALD are mainly reviewed,such as low deposition temperature,more choices of precursors and materials,flexible processing conditions and good film properties.However,it also faces some challenges from reduced film conformality and plasma damage.Several important applications of PEALD are reviewed,including the metal film deposition,Cu interconnection barrier layer,high dielectric constant materials,and encapsulation.Finally,the development prospects of PEALD are presented.
RESEARCH ON PERPENDICULARLY MAGNETIZED ELECTROLESSLY PLATED COBALT ALLOY FILMS USING MFM

CF Shen,J Tang,ZH Liu,HM Chen,PC Zhang,CL Bai

1996-01-01

Abstract:Many methods have been used to prepare the high-density perpendicular magnetic recording media. One of them is the electroless plating method. To study its potency for magnetic recording, the film’s magnetic structure is to be known. Magnetic force microscope (MFM) is a kind of scanning probe microscope (SPM). By controlling the scanning of a magnetized tip along the surface of the sample, MFM can image the magnetic field near the surface. MFM is widely used in studying magnetic head and magnetic structure of digits on disks, such as the size and shape of the digits, the recording noise of the media, the performance of rewriting and the capability to record at
The role of applied magnetic field in Co-doped ZnS thin films fabricated by pulsed laser deposition

Dongwen Gao,Li Wang,Xueqiong Su,Jin Wang,Ruixiang Chen

DOI: https://doi.org/10.1016/j.optmat.2021.110877

IF: 3.754

2021-04-01

Optical Materials

Abstract:<p>In recent years, chalcogenide glasses such as ZnS or ZnSe have attracted much attention due to their excellent optical properties. The structure of chalcogenide materials is part of the important factors affecting their optical properties. In this paper, the magnetic environment was set to control the growth structure of nano film in the process of deposition, which could be affected the optical properties of Co-doped ZnS (ZnS:Co) nano-film. All films were prepared by pulsed laser deposition (PLD). The results of XRD and Raman proved that the structure of the film was changed by the magnetic field. A broader band fluorescence characteristic in the film was shown by PL spectrum, which revealed a substantially improvement of the optical properties for this material. Under the condition of the magnetic field, consistency between FDTD (Finite difference time domain method, FDTD) simulation and experimental results further confirmed the improvement of the optical properties. The findings warrant that the optimized ZnS:Co thin films could be applied to develop efficient optical waveguide devices and laser gain media in the infrared field.</p>

materials science, multidisciplinary,optics

Pulsed Laser Deposition and Its Application in Magnetic Films

Research Progress of Magnetic Fluids

Optical-Electric Thin Films Produced By Low Voltage Reactive Plasma Assisted Deposition

Growth and Magnetism of Metallic Thin Films and Multilayers by Pulsed-Laser Deposition

Pulsed laser deposition technique and its applications in the study of functional thin films

Pulsed Laser Deposition of Diamond-Like Carbon Films under a Magnetic Field

Diamond-Like Carbon Thin-Film Deposition Using A Magnetically Confined Rf Pecvd System

High‐Quality NiFe Thin Films on Oxide/Non‐Oxide Platforms via Pulsed Laser Deposition at Room Temperature

Pulsed Laser Deposition of Organic Thin Films

Micro-structural and Optical Properties of Diamond-like Carbon Films Grown by Magnetic field-assisted Laser Deposition

A New Reactive Pulsed Laser Ablation Technique for the Deposition of Hard Carbon and Carbon-Nitride Thin Films

Recent Advances on Pulsed Laser Deposition of Large‐Scale Thin Films

High-quality NiFe thin films on oxide/non-oxide platforms via pulsed laser deposition at room temperature

Structure and Magnetism of Pulsed-Laser-deposited Ultrathin Films of Fe on Cu(100)

Growth, Structure, and Magnetism of Fcc Fe Ultrathin Films on Cu(111) by Pulsed Laser Deposition

A practical guide to pulsed laser deposition

Interactions Between Pulsed Laser-Induced Plasma and Ecr Microwave Plasma

Effect of Magnetic Field Type on the Flight State of Supersonic Plasma Spray Particles and Coating Properties

Principle and Applications of Plasma Enhanced Atomic Layer Deposition

RESEARCH ON PERPENDICULARLY MAGNETIZED ELECTROLESSLY PLATED COBALT ALLOY FILMS USING MFM

The role of applied magnetic field in Co-doped ZnS thin films fabricated by pulsed laser deposition