Abstract:Ionized physical vapor deposition techniques, such as high-power impulse magnetron sputtering (HiPIMS) are gaining popularity due to their ability to produce high-quality thin films at low deposition temperatures. In those techniques, ions are commonly accelerated onto the growing film using negative potential applied to the substrate. One key challenge however is, how such potentials can be applied on insulating or electrically floating substrates. In this work, we present a novel approach for low-temperature deposition of high-quality thin films on insulating substrates using Synchronized Floating Potential High-Power Impulse Magnetron Sputtering (SFP-HiPIMS). This technique leverages the negative floating potential, induced on the substrate during the HiPIMS discharge. By synchronizing the ion arrival with the substrate's floating potential, specific ions can be accelerated preferentially, thereby enhancing adatom mobility and improving film quality while mitigating the detrimental effects of Ar+ ion bombardment. Our proof-of-concept study demonstrates the deposition of high-quality, textured Al0.8Sc0.2N thin films on various insulating substrates at low temperatures. We show that synchronizing the Al and Sc ion fluxes with the induced negative floating potential significantly enhances the films' crystallinity, c-axis texture and at the same time reduces residual stress. In addition, it enables epitaxial growth on sapphire at temperatures as low as 100°C. The results of this study demonstrate that SFP-HiPIMS provides a practical and economical solution for a long-standing challenge in physical vapor deposition, which can be implemented in standard deposition equipment. SFP-HiPIMS therefore paves the way for advanced manufacturing processes in various emerging technologies.

Optical-Electric Thin Films Produced By Low Voltage Reactive Plasma Assisted Deposition

Some Oxide-Films Deposited By Reactive Low-Voltage Plasma-Assisted Evaporation

Study on the optical thin film deposited by plasma ion plating

A study of Electrochromic thin films and Devices by Photothermal Deflection Technique

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Recent Development of Low-Voltage Reactive-Ion-plating Deposition of Optical Thin Films in China

Ion Beam Assisted Thin Film Deposition

Reduction of charge-transfer resistance at the solid electrolyte – electrode interface by pulsed laser deposition of films from a crystalline Li 2 PO 2 N source

Lithium Phosphorus Oxynitride Thin Film Fabricated by a Nitrogen Plasma-Assisted Deposition of E-beam Reaction Evaporation

Electron Cyclotron Resonance Plasma-assisted Reactive Pulsed Laser Deposition of Compound Films

Low Temperature Deposition of Functional Thin Films on Insulating Substrates: Selective Ion Acceleration using Synchronized Floating Potential HiPIMS

Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition

Transparent Conductive P-Type Lithium-Doped Nickel Oxide Thin Films Deposited by Pulsed Plasma Deposition

Lanthanide-Assisted Deposition of Strongly Electro-optic PZT Thin Films on Silicon: Toward Integrated Active Nanophotonic Devices

TEXTURED TRANSPARENT CONDUCTIVE ZAO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING

Recent advances in the deposition of ferroelectric thin films

Low Voltage Ion Plating Technique for the Deposition of ZnS, MgF2 Films

Growth of Ultrathin Al2O3 Films on n-InP Substrates as Insulating Layers by RF Magnetron Sputtering and Study on the Optical and Dielectric Properties

Optoelectronic Properties of Cold Plasma-Deposited, Oxidized Sn–C Thin Films

Synthesis and Characterization of HfO2 and ZrO2 Thin Films Deposited by Plasma Assisted Reactive Pulsed Laser Deposition at Low Temperature

Nucleation and Growth Study of Al2O3 Film Fabricated Through Atomic Layer Deposition on Pet Substrate