Abstract:The sealing of pores in plasma electrolytic oxidation (PEO) coatings is critical to further enhance the protection of the underlying substrate and maintain the mechanical performance of coatings. This study focuses on the modification of the surface microstructure of PEO coatings on Ta-12W alloy by introducing NH 4 F additive into a mixed silicate-phosphate electrolyte. As a result, ultra-low porosity coating with a surface porosity of less than 1 % is effectively prepared. Detailed investigations have been conducted to study the effects of NH 4 F content and treatment duration on various coating characteristics, including microscopic morphology, elemental distribution, thickness, and phase composition. It is found that optimizing the concentration of NH 4 F eliminates the large pore structures and promotes the development of Ta-rich structures resembling pancakes on the coating surface. Furthermore, the intensities of diffraction peaks from different crystal faces of Ta 2 O 5 in coatings exhibit variations, and selective growth is observed specifically on its (110) crystal plane. After a 20-minute treatment of Ta-12W alloys in the electrolyte containing 4 g/L NH 4 F, the surface of the coating displays predominantly pancake-like structures with sealed pore/non-pore features. The formation process of these specific structures is discussed based on the evolution of coating morphology with oxidation time. It is proposed that the increase in anodic voltage and gas production in the late stage favors the breakdown of gas bubbles, leading to the creation of non-porous pancake-like structures on the surface. In addition, the breakdown of the dielectric layer at the periphery of gas bubbles results in the influx of film-forming materials into pores, which causes the formation of pancake-like structures with sealed pores.

Processing and Characterization of Ta2O5 Films Deposited by Pulsed Laser Ablation

Pulsed laser deposition of tantalum oxide thin films

Pulsed Laser Deposited Ta2o5 Thin Films As an Electrochromic Material

Electrical characterization of Ta2O5 films deposited by laser reactive ablation of metallic Ta

C-V and Dlts Studies of Al/Ta2o5/N-Si Structures with Ta2o5 Thin Films Deposited by Pulsed Laser Deposition

An Angle-Resolved Time-of-flight Mass Spectrometric Study of Pulsed Laser Ablated Ta2O5

Lithiation and electrochromic characteristics of composite Ta2O5-TiO2 films fabricated by ultraviolet reactive laser ablation

Study on microstructure, optical and tribological properties of self-formed Ta oxide films

Deposition of Cu2Ta4O12 by pulsed laser deposition

An Optical Emission Spectroscopic Study on Visible Laser Ablation of Ta2O5 in Ambient O2

Processing and Characterization of TiO2film Prepared on Glass Via Pulsed Laser Deposition

Deposition of Au/TiO2 Film by Pulsed Laser

An Investigation of Oxides of Tantalum Produced by Pulsed Laser Ablation and Continuous Wave Laser Heating

XPS Investigation of the Oxidation States of the As-Deposited Ta Films Prepared by Magnetron Sputtering Technology

Fabrication of ultra-low porosity plasma electrolytic oxidation coating on Ta-12W alloys and its formation mechanism

I-V and C-V Properties of TiO 2 Thin Film by Pulsed-Laser Reactive Deposition

A study on Ti-doped ZnO transparent conducting thin films fabricated by pulsed laser deposition

Deposition of Tantalum Oxide Films by Uv Laser Reactive Ablation in O-3 Ambient

Formaton of Lonic Ta-containing Oxides from Laser Ablation of Ta2O5 in Ambient O2

Effect of Nitrogen Doping on Tribological Properties of Ta2O5 Coatings Deposited by RF Magnetron Sputtering

Atomic layer deposition of Al2O3 and HfO2 for high power laser application