Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure

Chunrui Ma,Chonglin Chen
DOI: https://doi.org/10.1002/9783527696406.ch1
2016-01-01
Abstract:Chapter 1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure Chunrui Ma, Chunrui Ma Xi'an Jiaotong University, School of Materials Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, No.28, Xianning West Road, Xi'an, Shaanxi, 710049 P. R. ChinaSearch for more papers by this authorChonglin Chen, Chonglin Chen University of Texas at San Antonio, Department of Physics and Astronomy, One UTSA Circle, San Antonio, TX 78249 USASearch for more papers by this author Chunrui Ma, Chunrui Ma Xi'an Jiaotong University, School of Materials Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, No.28, Xianning West Road, Xi'an, Shaanxi, 710049 P. R. ChinaSearch for more papers by this authorChonglin Chen, Chonglin Chen University of Texas at San Antonio, Department of Physics and Astronomy, One UTSA Circle, San Antonio, TX 78249 USASearch for more papers by this author Book Editor(s):Yuan Lin, Yuan Lin University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin films and Integrated Devices, No. 4, Section 2, North Jianshe Road, Chengdu, Sichuan, 610054 PR ChinaSearch for more papers by this authorXin Chen, Xin Chen East China University of Science and Technology, 130 Meilong Road, 200237 Shanghai, ChinaSearch for more papers by this author First published: 08 September 2016 https://doi.org/10.1002/9783527696406.ch1Citations: 4 AboutPDFPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShareShare a linkShare onFacebookTwitterLinked InRedditWechat Summary Pulsed laser deposition (PLD) is one of the most promising techniques for the formation of complex-oxide heterostructures and nanostructure due to its simple setup and it can stoichiometrically transfer a material from a solid source to a substrate to form its thin film. This chapter details the PLD setup and focus primarily on operating principle, growth mechanism and parameter of PLD for complex oxide thin film and nanostructure. Citing Literature Advanced Nano Deposition Methods RelatedInformation
What problem does this paper attempt to address?