Study on exposure characteristics of prehardened dichromate gelation used as photoresist for enzyme etching

Jiyue Tang,Ping Xu,Bo Chen,L��Rong Guo
1997-01-01
Abstract:The exposure characteristic curves of prehardened dichromate gelatin used as photoresist for enzyme etching were derived. The effects of the background hardness of dichromate gelatin plate, the concentration of enzyme liquid and the temperature on the exposure characteristic curves were described. The linear dynamic state of enzyme etching was studied by experiment.
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