Abstract:The knowledge of the development behavior, especially the development rate, is of primary importance for the study of deep x-ray lithography in LIGA technique. In the first part of this paper, we have measured the development rates of crosslinked PMMA foils irradiated in NSRL covering a wide dose range (bottom dose in the range:2.5-8.0 kJ/cm(3)). After the exposure, we use a so-called period-development method (to dip development in GG-developer for 20 minutes and clean in rinse solution for 40 minutes as a development period). For processing the experiment data, we get the KD beta model to describe our PMMA/GG-developer system. The aim of this work is to find out a stable experiment condition for deep X-ray lithography and development. The result shows that in small amount of dose (bottom dose range: 2.5-4 kJ/cm3), this model is very stable. While in large amount of dose (bottom dose range: 5-8kJ/cm(3)), the model becomes very sensitive and even unavailable. To verify the conclusion validity, the fixed dose range (bottom dose range: 3.5-4 kJ/cm(3)) is applied on PMMA microstructures. And the result shows an effective development process. In the following procedure, mold inserts can be produced by micro-electroforming and plastic replicas can be mass produced by hot embossing. To emboss high-aspect-ratio microstructures, the deformation of microstructures usually occurs due to the demolding forces between the sidewall of mold inserts and the thermoplastic (PMMA). To minimize the friction force the optimized experiment has been performed using Ni-PTFE compound material mold inserts. Typical defects like pull-up and damaged edges can be greatly reduced.

Experimental Research on Reprocessing for Dichromated Gelatin Hologram

Absorption in dichromated gelation

Measurement of Reversible Rate of Conservation Materials Based on Gel Cleaning Approach

Chemical Cleaving Method of Relief Microstructure Formation on Dichromated Gelatin

Resistance of Dichromated Gelatin As Photoresist

True-color Reflection Holograms Recorded in a Single-Layer Panchromatic Dichromated Gelatin Material

Study on exposure characteristics of prehardened dichromate gelation used as photoresist for enzyme etching

Methylene-blue sensitized dichromated gelatin: wide-range colour adjustment of reflection hologram

Enhancing the Mechanical Properties of Regenerated Cellulose through High-Temperature Pre-Gelation

High-density holographic recording parameters under different wavelength of a two dyes-sensitized photopolymer

Electric Field in Volume Hologram Made with DCG

Reprocessing of Vitrimer

Structure and transition behavior of crosslinked poly(2-(2-methoxyethoxy) ethylmethacrylate- co -(ethyleneglycol) methacrylate) gel film on cellulosic-based flat substrate

Optimization of Acrylamide-based Photopolymer and Its Holographic Character Investigation

Characteristics Optimization of Organic Photopolymer Materials for Holographic Data Storage

Tuned chromic process for polydiacetylenes vesicles: The influence of polymer matrices

The Study of Deep Lithography and Moulding Process of Liga Technique

Wide-range Adjustment Technique of Playback Wavelength of MBDCG Lippmann Hologram

Methods About Swelling, Recovery and Preservation of Sephadex in Gel Filtration Chromatography

Preparation of a Cross-Linked Gelatin/bacteriorhodopsin Film and Its Photochromic Properties

Development of High Resolution Zone Plate by Holography and Ion-Etching Techniques