Ion Beam Syntheses and Microstructure Studies of A New Fesi2 Phase

S Jin,XN Li,Z Zhang,C Dong,ZX Gong,H Bender,TC Ma
DOI: https://doi.org/10.1063/1.363240
IF: 2.877
1996-01-01
Journal of Applied Physics
Abstract:Iron-silicide has been formed by ion implantation of iron into silicon (111). In the as-implanted sample, a new type of orthorhombic FeSi2 phase was found. Although the lattice parameters of the new phase are the same as those of the known semiconductor β-FeSi2, its point group and space group were different and determined to be mmm and Pbca, respectively.
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